Issued Patents All Time
Showing 26–50 of 142 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10465294 | Oxide and metal removal | Xikun Wang, Jie Liu, Nitin K. Ingle, Jeffrey W. Anthis, Benjamin Schmiege | 2019-11-05 |
| 10468267 | Water-free etching methods | Zhijun Chen, Lin Xu, Nitin K. Ingle | 2019-11-05 |
| 10424464 | Oxide etch selectivity systems and methods | Lin Xu, Zhijun Chen, Son T. Nguyen | 2019-09-24 |
| 10424463 | Oxide etch selectivity systems and methods | Lin Xu, Zhijun Chen, Son T. Nguyen | 2019-09-24 |
| 10319603 | Selective SiN lateral recess | Zhijun Chen, Jiayin Huang, Nitin K. Ingle | 2019-06-11 |
| 10319600 | Thermal silicon etch | Zihui Li, Rui Cheng, Nitin K. Ingle, Abhijit Basu Mallick | 2019-06-11 |
| 10283324 | Oxygen treatment for nitride etching | Zhijun Chen, Jiayin Huang | 2019-05-07 |
| 10249507 | Methods for selective etching of a silicon material | Zihui Li, Xing-Fu Zhong, Nitin K. Ingle | 2019-04-02 |
| 10204796 | Methods for selective etching of a silicon material using HF gas without nitrogen etchants | Nitin K. Ingle, Zihui Li, Mikhail Korolik | 2019-02-12 |
| 10204795 | Flow distribution plate for surface fluorine reduction | Jiayin Huang, Lin Xu, Zhijun Chen | 2019-02-12 |
| 10186428 | Removal methods for high aspect ratio structures | Lin Xu, Zhijun Chen, Jiayin Huang | 2019-01-22 |
| 10170336 | Methods for anisotropic control of selective silicon removal | Zihui Li, Chia-Ling Kao, Nitin K. Ingle | 2019-01-01 |
| 10134581 | Methods and apparatus for selective dry etch | Ning Li, Mihaela Balseanu, Li-Qun Xia, Dongqing Yang | 2018-11-20 |
| 10128086 | Silicon pretreatment for nitride removal | Jiayin Huang, Zhijun Chen, Nitin K. Ingle | 2018-11-13 |
| 10062579 | Selective SiN lateral recess | Zhijun Chen, Jiayin Huang, Nitin K. Ingle | 2018-08-28 |
| 10062578 | Methods for etch of metal and metal-oxide films | Jingchun Zhang, Nitin K. Ingle | 2018-08-28 |
| 10026597 | Hydrogen plasma based cleaning process for etch hardware | Chirantha Rodrigo, Jingchun Zhang, Lili Ji, Nitin K. Ingle | 2018-07-17 |
| 9991134 | Processing systems and methods for halide scavenging | Xinglong Chen, Zihui Li, Hiroshi Hamana, Zhijun Chen, Ching-Mei Hsu +5 more | 2018-06-05 |
| 9887096 | Differential silicon oxide etch | Seung Ho Park, Yunyu Wang, Jingchun Zhang, Nitin K. Ingle | 2018-02-06 |
| 9875907 | Self-aligned shielding of silicon oxide | Fei Wang, Mikhail Korolik, Nitin K. Ingle, Robert Jan Visser | 2018-01-23 |
| 9859128 | Self-aligned shielding of silicon oxide | Fei Wang, Mikhail Korolik, Nitin K. Ingle, Robert Jan Visser | 2018-01-02 |
| 9842744 | Methods for etch of SiN films | Jingchun Zhang, Nitin K. Ingle | 2017-12-12 |
| 9837284 | Oxide etch selectivity enhancement | Zhijun Chen, Nitin K. Ingle | 2017-12-05 |
| 9831097 | Methods for selective etching of a silicon material using HF gas without nitrogen etchants | Nitin K. Ingle, Zihui Li, Mikhail Korolik | 2017-11-28 |
| 9768034 | Removal methods for high aspect ratio structures | Lin Xu, Zhijun Chen, Jiayin Huang | 2017-09-19 |