Issued Patents All Time
Showing 226–250 of 259 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6277544 | Reverse lithographic process for semiconductor spaces | Bharath Rangarajan, Ursula Q. Quinto | 2001-08-21 |
| 6270579 | Nozzle arm movement for resist development | Ramkumar Subramanian, Khoi A. Phan, Bharath Rangarajan, Michael K. Templeton, Sanjay K. Yedur | 2001-08-07 |
| 6270929 | Damascene T-gate using a relacs flow | Christopher F. Lyons, Ramkumar Subramanian, Marina V. Plat | 2001-08-07 |
| 6262484 | Dual damascene method for backened metallization using poly stop layers | Bharath Rangarajan, Ramkumar Subramanian | 2001-07-17 |
| 6255202 | Damascene T-gate using a spacer flow | Christopher F. Lyons, Ramkumar Subramanian, Marina V. Plat | 2001-07-03 |
| 6251570 | Resist developer saving system using material to reduce surface tension and wet resist surface | Khoi A. Phan, Ramkumar Subramanian, Bharath Rangarajan | 2001-06-26 |
| 6248175 | Nozzle arm movement for resist development | Ramkumar Subramanian, Khoi A. Phan, Bharath Rangarajan, Michael K. Templeton, Sanjay K. Yedur | 2001-06-19 |
| 6245493 | Method for reducing surface reflectivity by increasing surface roughness | Bharath Rangarajan, Sanjay K. Yedur, Michael K. Templeton, Christopher F. Lyons | 2001-06-12 |
| 6238830 | Active control of temperature in scanning probe lithography and maskless lithograpy | Bharath Rangarajan, Michael K. Templeton | 2001-05-29 |
| 6232048 | Method for preparing narrow photoresist lines | Matthew S. Buynoski, Che-Hoo Ng, Shekhan Pramanick, Subhash Gupta | 2001-05-15 |
| 6221777 | Reverse lithographic process for semiconductor vias | Bharath Rangarajan, Ursula Q. Quinto | 2001-04-24 |
| 6210846 | Exposure during rework for enhanced resist removal | Bharath Rangarajan, Ursula Q. Quinto | 2001-04-03 |
| 6197455 | Lithographic mask repair using a scanning tunneling microscope | Sanjay K. Yedur, Bharath Rangarajan, Michael K. Templeton, Kathleen R. Early | 2001-03-06 |
| 6190062 | Cleaning chamber built into SEM for plasma or gaseous phase cleaning | Ramkumar Subramanian, Khoi A. Phan, Bharath Rangarajan, Bryan K. Choo, Sanjay K. Yedur | 2001-02-20 |
| 6191046 | Deposition of an oxide layer to facilitate photoresist rework on polygate layer | Sanjay K. Yedur, Bharath Rangarajan | 2001-02-20 |
| 6187666 | CVD plasma process to fill contact hole in damascene process | Michael K. Templeton, Bharath Rangarajan, Christopher F. Lyons, Sanjay K. Yedur, Ramkumar Subramanian | 2001-02-13 |
| 6171737 | Low cost application of oxide test wafer for defect monitor in photolithography process | Khoi A. Phan, Shobhana Punjabi, Robert J. Chiu | 2001-01-09 |
| 6165855 | Antireflective coating used in the fabrication of microcircuit structures in 0.18 micron and smaller technologies | Paul R. Besser, Darrell M. Erb, Susan H. Chen, Carmen Morales | 2000-12-26 |
| 6136514 | Resist developer saving system using material to reduce surface tension and wet resist surface | Khoi A. Phan, Ramkumar Subramanian, Bharath Rangarajan | 2000-10-24 |
| 6117618 | Carbonized antireflective coating produced by spin-on polymer material | Sanjay K. Yedur, Bharath Rangarajan, Michael K. Templeton | 2000-09-12 |
| 6093973 | Hard mask for metal patterning | Minh Van Ngo, Dawn Hopper, Carmen Morales | 2000-07-25 |
| 6087255 | Conductive layer with anti-reflective surface portion | Shekhar Pramanick, Che-Hoo Ng | 2000-07-11 |
| 6071824 | Method and system for patterning to enhance performance of a metal layer of a semiconductor device | Subhash Gupta, Mutya Vicente, Susan H. Chen | 2000-06-06 |
| 6066578 | Method and system for providing inorganic vapor surface treatment for photoresist adhesion promotion | Subhash Gupta, Carmen Morales | 2000-05-23 |
| 6063531 | Focus monitor structure and method for lithography process | Bharath Rangarajan, Khoi A. Phan, Carmen Morales | 2000-05-16 |