Issued Patents All Time
Showing 176–200 of 259 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6465156 | Method for mitigating formation of silicon grass | Bharath Rangarajan, Steven C. Avanzino | 2002-10-15 |
| 6458607 | Using UV/VIS spectrophotometry to regulate developer solution during a development process | Bharath Rangarajan, Ramkumar Subramanian | 2002-10-01 |
| 6459945 | System and method for facilitating determining suitable material layer thickness in a semiconductor device fabrication process | Carmen Morales, Bharath Rangarajan | 2002-10-01 |
| 6459482 | Grainless material for calibration sample | Ramkumar Subramanian, Khoi A. Phan, Bharath Rangarajan, Michael K. Templeton, Sanjay K. Yedur +1 more | 2002-10-01 |
| 6458691 | Dual inlaid process using an imaging layer to protect via from poisoning | Ramkumar Subramanian, Christopher F. Lyons, Marina V. Plat | 2002-10-01 |
| 6455416 | Developer soluble dyed BARC for dual damascene process | Ramkumar Subramanian, Bharath Rangarajan, Michael K. Templeton | 2002-09-24 |
| 6455847 | Carbon nanotube probes in atomic force microscope to detect partially open/closed contacts | Sanjay K. Yedur, Bryan K. Choo | 2002-09-24 |
| 6455332 | Methodology to mitigate electron beam induced charge dissipation on polysilicon fine patterning | Michael K. Templeton | 2002-09-24 |
| 6451512 | UV-enhanced silylation process to increase etch resistance of ultra thin resists | Bharath Rangarajan, Ramkumar Subramanian, Khoi A. Phan, Michael K. Templeton, Sanjay K. Yedur +1 more | 2002-09-17 |
| 6452161 | Scanning probe microscope having optical fiber spaced from point of hp | Sanjay K. Yedur, Bryan K. Choo, Carmen Morales | 2002-09-17 |
| 6451621 | Using scatterometry to measure resist thickness and control implant | Bharath Rangarajan, Ramkumar Subramanian | 2002-09-17 |
| 6448097 | Measure fluorescence from chemical released during trim etch | Bharath Rangarajan, Ramkumar Subramanian | 2002-09-10 |
| 6444381 | Electron beam flood exposure technique to reduce the carbon contamination | Ramkumar Subramanian, Michael K. Templeton, Bharath Rangarajan, Khoi A. Phan, Bryan K. Choo +1 more | 2002-09-03 |
| 6445072 | Deliberate void in innerlayer dielectric gapfill to reduce dielectric constant | Ramkumar Subramanian, Michael K. Templeton, Bharath Rangarajan | 2002-09-03 |
| 6444373 | Modification of mask layout data to improve mask fidelity | Ramkumar Subramanian, Khoi A. Phan, Bharath Rangarajan | 2002-09-03 |
| 6440289 | Method for improving seed layer electroplating for semiconductor | Christy Mei-Chu Woo, Bharath Rangarajan | 2002-08-27 |
| 6441349 | System for facilitating uniform heating temperature of photoresist | Bharath Rangarajan, Sanjay K. Yedur | 2002-08-27 |
| 6439963 | System and method for mitigating wafer surface disformation during chemical mechanical polishing (CMP) | Bharath Rangarajan, Ursula Q. Quinto | 2002-08-27 |
| 6437329 | Use of carbon nanotubes as chemical sensors by incorporation of fluorescent molecules within the tube | Sanjay K. Yedur, Bryan K. Choo | 2002-08-20 |
| 6429141 | Method of manufacturing a semiconductor device with improved line width accuracy | Minh Van Ngo, Dawn Hopper, Carmen Morales | 2002-08-06 |
| 6422918 | Chemical-mechanical polishing of photoresist layer | Steven C. Avanzino, Bharath Rangarajan, Alvin M. Dangca | 2002-07-23 |
| 6424039 | Dual damascene process using sacrificial spin-on materials | Fei Wang, James Kai | 2002-07-23 |
| 6423479 | Cleaning carbon contamination on mask using gaseous phase | Ramkumar Subramanian, Khoi A. Phan, Bharath Rangarajan, Sanjay K. Yedur, Bryan K. Choo | 2002-07-23 |
| 6423650 | Ultra-thin resist coating quality by increasing surface roughness of the substrate | Marina V. Plat, Christopher F. Lyons, Michael K. Templeton | 2002-07-23 |
| 6420702 | Non-charging critical dimension SEM metrology standard | Nicholas H. Tripsas, Michael K. Templeton | 2002-07-16 |