Issued Patents All Time
Showing 126–150 of 259 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6594024 | Monitor CMP process using scatterometry | Ramkumar Subramanian, Khoi A. Phan, Bharath Rangarajan, Carmen Morales | 2003-07-15 |
| 6591658 | Carbon nanotubes as linewidth standards for SEM & AFM | Sanjay K. Yedur, Bryan K. Choo, Michael K. Templeton, Ramkumar Subramanian | 2003-07-15 |
| 6592932 | Nozzle arm movement for resist development | Ramkumar Subramanian, Khoi A. Phan, Bharath Rangarajan, Michael K. Templeton, Sanjay K. Yedur | 2003-07-15 |
| 6593210 | Self-aligned/maskless reverse etch process using an inorganic film | Bharath Rangarajan, Ursula Q. Quinto | 2003-07-15 |
| 6593748 | Process integration of electrical thickness measurement of gate oxide and tunnel oxides by corona discharge technique | Arvind Halliyal, Ramkumar Subramanian | 2003-07-15 |
| 6589804 | Oxide/nitride or oxide/nitride/oxide thickness measurement using scatterometry | Arvind Halliyal, Ramkumar Subramanian | 2003-07-08 |
| 6589711 | Dual inlaid process using a bilayer resist | Ramkumar Subramanian, Christopher F. Lyons, Marina V. Plat | 2003-07-08 |
| 6589717 | Photon assisted deposition of hard mask formation for use in manufacture of both devices and masks | Kouros Ghandehari, Bruno M. LaFontaine | 2003-07-08 |
| 6583871 | System and method to measure closed area defects | Bharath Rangarajan, Khoi A. Phan, Ramkumar Subramanian | 2003-06-24 |
| 6579651 | Modification of mask layout data to improve mask fidelity | Ramkumar Subramanian, Khoi A. Phan, Bharath Rangarajan | 2003-06-17 |
| 6579733 | Using scatterometry to measure resist thickness and control implant | Bharath Rangarajan, Ramkumar Subramanian | 2003-06-17 |
| 6573497 | Calibration of CD-SEM by e-beam induced current measurement | Bharath Rangarajan, Khoi A. Phan, Michael K. Templeton | 2003-06-03 |
| 6572252 | System and method for illuminating a semiconductor processing system | Bharath Rangarajan, Khoi A. Phan, Bryan K. Choo, Ramkumar Subramanian | 2003-06-03 |
| 6573498 | Electric measurement of reference sample in a CD-SEM and method for calibration | Bharath Rangarajan, Khoi A. Phan, Michael K. Templeton | 2003-06-03 |
| 6570157 | Multi-pitch and line calibration for mask and wafer CD-SEM system | Khoi A. Phan, Bharath Rangarajan | 2003-05-27 |
| 6566655 | Multi-beam SEM for sidewall imaging | Bryan K. Choo, Sanjay K. Yedur | 2003-05-20 |
| 6561706 | Critical dimension monitoring from latent image | Michael K. Templeton, Bharath Rangarajan, Ramkumar Subramanian | 2003-05-13 |
| 6562248 | Active control of phase shift mask etching process | Ramkumar Subramanian, Michael K. Templeton | 2003-05-13 |
| 6563578 | In-situ thickness measurement for use in semiconductor processing | Arvind Halliyal, Khoi A. Phan | 2003-05-13 |
| 6562185 | Wafer based temperature sensors for characterizing chemical mechanical polishing processes | Steven C. Avanzino, Bharath Rangarajan, Ramkumar Subramanian | 2003-05-13 |
| 6559457 | System and method for facilitating detection of defects on a wafer | Khoi A. Phan, Bharath Rangarajan | 2003-05-06 |
| 6559446 | System and method for measuring dimensions of a feature having a re-entrant profile | Bryan K. Choo | 2003-05-06 |
| 6558965 | Measuring BARC thickness using scatterometry | Ramkumar Subramanian, Christopher F. Lyons, Marina V. Plat | 2003-05-06 |
| 6556303 | Scattered signal collection using strobed technique | Bharath Rangarajan, Michael K. Templeton, Khoi A. Phan | 2003-04-29 |
| 6545753 | Using scatterometry for etch end points for dual damascene process | Ramkumar Subramanian, Michael K. Templeton | 2003-04-08 |