Issued Patents All Time
Showing 101–125 of 259 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6684172 | Sensor to predict void free films using various grating structures and characterize fill performance | Ramkumar Subramanian, Steven C. Avanzino, Christopher F. Lyons, Khoi A. Phan, Bharath Rangarajan +1 more | 2004-01-27 |
| 6673524 | Attenuating extreme ultraviolet (EUV) phase-shifting mask fabrication method | Kouros Ghandehari, Bruno M. LaFontaine | 2004-01-06 |
| 6670271 | Growing a dual damascene structure using a copper seed layer and a damascene resist structure | Ramkumar Subramanian, Michael K. Templeton, Bharath Rangarajan | 2003-12-30 |
| 6664030 | System for and method of constructing an alternating phase-shifting mask | Kouros Ghandehari, Bruno M. LaFontaine | 2003-12-16 |
| 6665065 | Defect detection in pellicized reticles via exposure at short wavelengths | Khoi A. Phan, Wolfram Porsche | 2003-12-16 |
| 6664180 | Method of forming smaller trench line width using a spacer hard mask | Angela T. Hui | 2003-12-16 |
| 6653221 | Method of forming a ground in SOI structures | Ramkumar Subramanian, Bharath Rangarajan | 2003-11-25 |
| 6654660 | Controlling thermal expansion of mask substrates by scatterometry | Christopher F. Lyons, Bharath Rangarajan, Khoi A. Phan, Ramkumar Subramanian | 2003-11-25 |
| 6649426 | System and method for active control of spacer deposition | Bharath Rangarajan, Michael K. Templeton | 2003-11-18 |
| 6650422 | Scatterometry techniques to ascertain asymmetry profile of features and generate a feedback or feedforward process control data associated therewith | Michael K. Templeton, Bharath Rangarajan, Ramkumar Subramanian | 2003-11-18 |
| 6645702 | Treat resist surface to prevent pattern collapse | Bharath Rangarajan, Michael K. Templeton | 2003-11-11 |
| 6641963 | System and method for in situ control of post exposure bake time and temperature | Bharath Rangarajan, Michael K. Templeton, Ramkumar Subramanian | 2003-11-04 |
| 6635874 | Self-cleaning technique for contamination on calibration sample in SEM | Michael K. Templeton, Sanjay K. Yedur, Bryan K. Choo | 2003-10-21 |
| 6633392 | X-ray reflectance system to determine suitability of SiON ARC layer | Arvind Halliyal, Ramkumar Subramanian | 2003-10-14 |
| 6632283 | System and method for illuminating a semiconductor processing system | Bharath Rangarajan, Khoi A. Phan, Bryan K. Choo, Ramkumar Subramanian | 2003-10-14 |
| 6630361 | Use of scatterometry for in-situ control of gaseous phase chemical trim process | Bharath Rangarajan, Michael K. Templeton, Ramkumar Subramanian, Cristina Cheung | 2003-10-07 |
| 6629786 | Active control of developer time and temperature | Bharath Rangarajan, Michael K. Templeton, Ramkumar Subramanian | 2003-10-07 |
| 6627526 | Method for fabricating a conductive structure for a semiconductor device | Wenge Yang | 2003-09-30 |
| 6622547 | System and method for facilitating selection of optimized optical proximity correction | Khoi A. Phan, Ramkumar Subramanian | 2003-09-23 |
| 6617087 | Use of scatterometry to measure pattern accuracy | Bharath Rangarajan, Ramkumar Subramanian | 2003-09-09 |
| 6613500 | Reducing resist residue defects in open area on patterned wafer using trim mask | Khoi A. Phan, Ramkumar Subramanian, Michael K. Templeton, Jeff P. Erhardt | 2003-09-02 |
| 6605546 | Dual bake for BARC fill without voids | Ramkumar Subramanian, Wolfram Grundke, Christopher F. Lyons, Marina V. Plat | 2003-08-12 |
| 6605855 | CVD plasma process to fill contact hole in damascene process | Michael K. Templeton, Bharath Rangarajan, Christopher F. Lyons, Sanjay K. Yedur, Ramkumar Subramanian | 2003-08-12 |
| 6602727 | Scatterometry based active control of exposure conditions | Bharath Rangarajan, Ramkumar Subramanian | 2003-08-05 |
| 6597463 | System to determine suitability of sion arc surface for DUV resist patterning | Cristina Cheung, Jay Bhakta, Carmen Morales, Junwei Bao | 2003-07-22 |