Issued Patents All Time
Showing 151–175 of 259 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6545273 | Use of multiple tips on AFM to deconvolve tip effects | Bharath Rangarajan, Sanjay K. Yedur | 2003-04-08 |
| 6541184 | Nozzle arm movement for resist development | Ramkumar Subramanian, Khoi A. Phan, Bharath Rangarajan, Michael K. Templeton, Sanjay K. Yedur | 2003-04-01 |
| 6541360 | Bi-layer trim etch process to form integrated circuit gate structures | Marina V. Plat, Scott A. Bell, Christopher F. Lyons, Ramkumar Subramanian | 2003-04-01 |
| 6535288 | Machine readable code to trigger data collection | Bharath Rangarajan, Michael K. Templeton, Khoi A. Phan | 2003-03-18 |
| 6534418 | Use of silicon containing imaging layer to define sub-resolution gate structures | Marina V. Plat, Scott A. Bell, Christopher F. Lyons, Ramkumar Subramanian | 2003-03-18 |
| 6528398 | Thinning of trench and line or contact spacing by use of dual layer photoresist | Kouros Ghandehari, Angela T. Hui | 2003-03-04 |
| 6516528 | System and method to determine line edge roughness and/or linewidth | Bryan K. Choo | 2003-02-11 |
| 6514867 | Method of creating narrow trench lines using hard mask | Angela T. Hui | 2003-02-04 |
| 6515342 | Method and system for providing inorganic vapor surface treatment for photoresist adhesion promotion | Subhash Gupta, Carmen Morales | 2003-02-04 |
| 6514874 | Method of using controlled resist footing on silicon nitride substrate for smaller spacing of integrated circuit device features | James Yu, Angela T. Hui | 2003-02-04 |
| 6514868 | Method of creating a smaller contact using hard mask | Angela T. Hui | 2003-02-04 |
| 6514849 | Method of forming smaller contact size using a spacer hard mask | Angela T. Hui | 2003-02-04 |
| 6513996 | Integrated equipment to drain water-hexane developer for pattern collapse | Ramkumar Subramanian, Michael K. Templeton | 2003-02-04 |
| 6510730 | System and method for facilitating selection of optimized optical proximity correction | Khoi A. Phan, Ramkumar Subramanian | 2003-01-28 |
| 6507474 | Using localized ionizer to reduce electrostatic charge from wafer and mask | Ramkumar Subramanian, Khoi A. Phan, Bryan K. Choo, Bharath Rangarajan | 2003-01-14 |
| 6501534 | Automated periodic focus and exposure calibration of a lithography stepper | Ramkumar Subramanian, Bharath Rangarajan, Carmen Morales | 2002-12-31 |
| 6500587 | Binary and attenuating phase-shifting masks for multiple wavelengths | Kouros Ghandehari, Carl P. Babcock | 2002-12-31 |
| 6501555 | Optical technique to detect etch process termination | Kouros Ghandehari, Angela T. Hui | 2002-12-31 |
| 6486078 | Super critical drying of low k materials | Bharath Rangarajan, Ramkumar Subramanian | 2002-11-26 |
| 6486072 | System and method to facilitate removal of defects from a substrate | Khoi A. Phan, Bharath Rangarajan | 2002-11-26 |
| 6482558 | Conducting electron beam resist thin film layer for patterning of mask plates | Ramkumar Subramanian, Bharath Rangarajan | 2002-11-19 |
| 6479817 | Cantilever assembly and scanning tip therefor with associated optical sensor | Sanjay K. Yedur, Bryan K. Choo, Carmen Morales | 2002-11-12 |
| 6479820 | Electrostatic charge reduction of photoresist pattern on development track | Ramkumar Subramanian, Bharath Rangarajan, Khoi A. Phan, Bryan K. Choo | 2002-11-12 |
| 6478484 | Feed-forward mechanism from latent images to developer system for photoresist linewidth control | — | 2002-11-12 |
| 6475867 | Method of forming integrated circuit features by oxidation of titanium hard mask | Angela T. Hui, Kouros Ghandehari | 2002-11-05 |