Issued Patents All Time
Showing 201–225 of 259 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6416933 | Method to produce small space pattern using plasma polymerization layer | Bharath Rangarajan, Wenge Yang | 2002-07-09 |
| 6417084 | T-gate formation using a modified conventional poly process | Marina V. Plat, Ramkumar Subramanian, Christopher F. Lyons | 2002-07-09 |
| 6413857 | Method of creating ground to avoid charging in SOI products | Ramkumar Subramanian, Bharath Rangarajan | 2002-07-02 |
| 6403456 | T or T/Y gate formation using trim etch processing | Marina V. Plat, Christopher F. Lyons, Ramkumar Subramanian | 2002-06-11 |
| 6403500 | Cross-shaped resist dispensing system and method | James Yu, Kouros Ghandehari | 2002-06-11 |
| 6396059 | Using a crystallographic etched silicon sample to measure and control the electron beam width of a SEM | Bryan K. Choo, Sanjay K. Yedur | 2002-05-28 |
| 6383952 | RELACS process to double the frequency or pitch of small feature formation | Ramkumar Subramanian, Marina V. Plat, Christopher F. Lyons, Scott A. Bell | 2002-05-07 |
| 6383947 | Anti-reflective coating used in the fabrication of microcircuit structures in 0.18 micron and smaller technologies | Paul R. Besser, Darrell M. Erb, Susan H. Chen, Carmen Morales | 2002-05-07 |
| 6376013 | Multiple nozzles for dispensing resist | Bharath Rangarajan, Sanjay K. Yedur, Michael K. Templeton | 2002-04-23 |
| 6373053 | Analysis of CD-SEM signal to detect scummed/closed contact holes and lines | Bryan K. Choo, Sanjay K. Yedur, Khoi A. Phan | 2002-04-16 |
| 6371134 | Ozone cleaning of wafers | Ramkumar Subramanian, Khoi A. Phan, Bharath Rangarajan, Sanjay K. Yedur, Bryan K. Choo | 2002-04-16 |
| 6372614 | Dual damascene method for backened metallization using poly stop layers | Bharath Rangarajan, Ramkumar Subramanian | 2002-04-16 |
| 6358843 | Method of making ultra small vias for integrated circuits | Carl P. Babcock | 2002-03-19 |
| 6354133 | Use of carbon nanotubes to calibrate conventional tips used in AFM | Sanjay K. Yedur, Bryan K. Choo, Michael K. Templeton, Ramkumar Subramanian | 2002-03-12 |
| 6352817 | Methodology for mitigating formation of t-tops in photoresist | Bharath Rangarajan, Steven C. Avanzino | 2002-03-05 |
| 6339955 | Thickness measurement using AFM for next generation lithography | Khoi A. Phan, Bharath Rangarajan | 2002-01-22 |
| 6335152 | Use of RTA furnace for photoresist baking | Ramkumar Subramanian, Bharath Rangarajan, Michael K. Templeton | 2002-01-01 |
| 6329124 | Method to produce high density memory cells and small spaces by using nitride spacer | Bharath Rangarajan, Michael K. Templeton | 2001-12-11 |
| 6326231 | Use of silicon oxynitride ARC for metal layers | Ramkumar Subramanian, Sanjay K. Yedur, Marina V. Plat, Christopher F. Lyons, Bharath Rangarajan +1 more | 2001-12-04 |
| 6322009 | Common nozzle for resist development | Ramkumar Subramanian, Khoi A. Phan, Bharath Rangarajan | 2001-11-27 |
| 6319802 | T-gate formation using modified damascene processing with two masks | Ramkumar Subramanian, Christopher F. Lyons, Marina V. Plat | 2001-11-20 |
| 6319643 | Conductive photoresist pattern for long term calibration of scanning electron microscope | Bryan K. Choo, Ramkumar Subramanian | 2001-11-20 |
| 6313019 | Y-gate formation using damascene processing | Ramkumar Subramanian, Christopher F. Lyons, Marina V. Plat | 2001-11-06 |
| 6291135 | Ionization technique to reduce defects on next generation lithography mask during exposure | Khoi A. Phan, Bharath Rangarajan | 2001-09-18 |
| 6287959 | Deep submicron metallization using deep UV photoresist | Christopher F. Lyons | 2001-09-11 |