| 11199778 |
Polymer brush adhesion promoter with UV cleavable linker |
Jing Guo, Bharat Kumar, Ekmini Anuja De Silva, Jennifer Church, Dario L. Goldfarb |
2021-12-14 |
| 11195995 |
Back-end-of-line compatible processing for forming an array of pillars |
Chi-Chun Liu, Yann Mignot, Ekmini Anuja De Silva, John C. Arnold |
2021-12-07 |
| 11192101 |
Method to create multilayer microfluidic chips using spin-on carbon as gap filling materials |
Chi-Chun Liu, Yann Mignot, Joshua T. Smith, Bassem M. Hamieh, Robert L. Bruce |
2021-12-07 |
| 11177130 |
Patterning material film stack with metal-containing top coat for enhanced sensitivity in extreme ultraviolet (EUV) lithography |
Ekmini Anuja De Silva, Dario L. Goldfarb, Daniel A. Corliss, Rudy J. Wojtecki |
2021-11-16 |
| 11171002 |
Alternating hardmasks for tight-pitch line formation |
John C. Arnold, Anuja E. DeSilva, Chi-Chun Liu, Yann Mignot, Stuart A. Sieg |
2021-11-09 |
| 11164772 |
Spacer-defined process for lithography-etch double patterning for interconnects |
Ekmini Anuja De Silva, Luciana Meli Thompson, Yann Mignot |
2021-11-02 |
| 11131919 |
Extreme ultraviolet (EUV) mask stack processing |
Yongan Xu, Zhenxing Bi, Yann Mignot, Ekmini Anuja De Silva |
2021-09-28 |
| 11133195 |
Inverse tone pillar printing method using polymer brush grafts |
Ekmini Anuja De Silva, Praveen Joseph, Ashim Dutta |
2021-09-28 |
| 11133260 |
Self-aligned top via |
Chi-Chun Liu, John C. Arnold, Dominik Metzler, Ashim Dutta |
2021-09-28 |
| 11121024 |
Tunable hardmask for overlayer metrology contrast |
Ekmini Anuja De Silva, Indira Seshadri, Stuart A. Sieg |
2021-09-14 |
| 11084032 |
Method to create multilayer microfluidic chips using spin-on carbon as gap fill and spin-on glass tone inversion |
Chi-Chun Liu, Yann Mignot, Joshua T. Smith, Bassem M. Hamieh, Robert L. Bruce |
2021-08-10 |
| 11067896 |
Dynamic adjustment of post exposure bake during lithography utilizing real-time feedback for wafer exposure delay |
Cody J. Murray, Ekmini Anuja De Silva, Alex Richard Hubbard, Karen E. Petrillo |
2021-07-20 |
| 11054250 |
Multi-channel overlay metrology |
Gangadhara Raja Muthinti, Chiew-Seng Koay, Siva Kanakasabapathy |
2021-07-06 |
| 11037786 |
Patterning material film stack with metal-containing top coat for enhanced sensitivity in extreme ultraviolet (EUV) lithography |
Ekmini Anuja De Silva, Dario L. Goldfarb, Daniel A. Corliss, Rudy J. Wojtecki |
2021-06-15 |
| 11031248 |
Alternating hardmasks for tight-pitch line formation |
Sean D. Burns, Chi-Chun Liu, Yann Mignot, Stuart A. Sieg |
2021-06-08 |
| 11018007 |
Self aligned pattern formation post spacer etchback in tight pitch configurations |
Sean D. Burns, Lawrence A. Clevenger, Matthew E. Colburn, Sivananda K. Kanakasabapathy, Christopher J. Penny +2 more |
2021-05-25 |
| 10998192 |
Sequential infiltration synthesis extreme ultraviolet single expose patterning |
Ekmini Anuja De Silva, Jing Guo, Luciana Meli |
2021-05-04 |
| 10950440 |
Patterning directly on an amorphous silicon hardmask |
Abraham Arceo de la Pena, Ekmini Anuja De Silva |
2021-03-16 |
