Issued Patents 2021
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11194254 | Lithography process delay characterization and effective dose compensation | Christopher F. Robinson, Ekmini Anuja De Silva, Cody J. Murray | 2021-12-07 |
| 10998192 | Sequential infiltration synthesis extreme ultraviolet single expose patterning | Ekmini Anuja De Silva, Jing Guo, Nelson Felix | 2021-05-04 |