| 11171001 |
Multiple patterning scheme integration with planarized cut patterning |
Hsueh-Chung Chen, Lawrence A. Clevenger, Yann Mignot, Cornelius Brown Peethala |
2021-11-09 |
| 11152298 |
Metal via structure |
Yann Mignot, James J. Kelly, Muthumanickam Sankarapandian, Hsueh-Chung Chen, Daniel J. Vincent |
2021-10-19 |
| 11131919 |
Extreme ultraviolet (EUV) mask stack processing |
Zhenxing Bi, Yann Mignot, Nelson Felix, Ekmini Anuja De Silva |
2021-09-28 |
| 11111176 |
Methods and apparatus of processing transparent substrates |
Chien-An Chen, Ludovic Godet |
2021-09-07 |
| 11069564 |
Double metal patterning |
Hsueh-Chung Chen, Yann Mignot, James J. Kelly, Lawrence A. Clevenger |
2021-07-20 |
| 11062911 |
Two-color self-aligned double patterning (SADP) to yield static random access memory (SRAM) and dense logic |
Fee Li Lie, Dongbing Shao, Robert C. Wong |
2021-07-13 |
| 11037822 |
Svia using a single damascene interconnect |
Yann Mignot, Muthumanickam Sankarapandian, Joe Lee |
2021-06-15 |
| 11031246 |
EUV pattern transfer with ion implantation and reduced impact of resist residue |
Yann Mignot, Oleg Gluschenkov |
2021-06-08 |
| 11022887 |
Tunable adhesion of EUV photoresist on oxide surface |
Jing Guo, Ekmini Anuja De Silva, Oleg Gluschenkov |
2021-06-01 |
| 10975464 |
Hard mask films with graded vertical concentration formed using reactive sputtering in a radio frequency deposition chamber |
Ekmini Anuja De Silva, Abraham Arceo de la Pena, Chih-Chao Yang |
2021-04-13 |
| 10957552 |
Extreme ultraviolet lithography patterning with directional deposition |
Ekmini Anuja De Silva, Su Chen Fan, Yann Mignot |
2021-03-23 |
| 10937653 |
Multiple patterning scheme integration with planarized cut patterning |
Hsueh-Chung Chen, Lawrence A. Clevenger, Yann Mignot, Cornelius Brown Peethala |
2021-03-02 |
| 10930504 |
Selective gas etching for self-aligned pattern transfer |
John C. Arnold, Sean D. Burns, Yann Mignot |
2021-02-23 |
| 10921721 |
Measurement system and grating pattern array |
Jinxin FU, Yifei Wang, Ludovic Godet |
2021-02-16 |
| 10915085 |
Developer critical dimension control with pulse development |
Richard C. Johnson, Hao Tang |
2021-02-09 |
| 10915690 |
Via design optimization to improve via resistance |
Dongbing Shao, Shyng-Tsong Chen, Zheng Xu |
2021-02-09 |
| 10886197 |
Controlling via critical dimension with a titanium nitride hard mask |
Yann Mignot, Muthumanickam Sankarapandian |
2021-01-05 |
