Issued Patents 2021
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10975464 | Hard mask films with graded vertical concentration formed using reactive sputtering in a radio frequency deposition chamber | Ekmini Anuja De Silva, Yongan Xu, Chih-Chao Yang | 2021-04-13 |
| 10950440 | Patterning directly on an amorphous silicon hardmask | Ekmini Anuja De Silva, Nelson Felix | 2021-03-16 |