| 11189729 |
Forming a sacrificial liner for dual channel devices |
Huiming Bu, Kangguo Cheng, Dechao Guo, Peng Xu |
2021-11-30 |
| 11152489 |
Additive core subtractive liner for metal cut etch processes |
Ruqiang Bao, Kisup Chung, Andrew M. Greene, David L. Rath, Indira Seshadri +1 more |
2021-10-19 |
| 11145658 |
Semiconductor structures with deep trench capacitor and methods of manufacture |
Kevin K. Chan, Babar A. Khan, Masaharu Kobayashi, Effendi Leobandung, Theodorus E. Standaert +1 more |
2021-10-12 |
| 11107821 |
Semiconductor structures with deep trench capacitor and methods of manufacture |
Kevin K. Chan, Babar A. Khan, Masaharu Kobayashi, Effendi Leobandung, Theodoras E. Standaert +1 more |
2021-08-31 |
| 11094824 |
Forming a sacrificial liner for dual channel devices |
Huiming Bu, Kangguo Cheng, Dechao Guo, Peng Xu |
2021-08-17 |
| 11081566 |
Self-aligned contacts for vertical field effect transistors |
Su Chen Fan, Ekmini Anuja De Silva |
2021-08-03 |
| 11075281 |
Additive core subtractive liner for metal cut etch processes |
Ruqiang Bao, Kisup Chung, Andrew M. Greene, David L. Rath, Indira Seshadri +1 more |
2021-07-27 |
| 11056493 |
Semiconductor structures with deep trench capacitor and methods of manufacture |
Kevin K. Chan, Babar A. Khan, Masaharu Kobayashi, Effendi Leobandung, Theodorus E. Standaert +1 more |
2021-07-06 |
| 11018007 |
Self aligned pattern formation post spacer etchback in tight pitch configurations |
Sean D. Burns, Lawrence A. Clevenger, Matthew E. Colburn, Nelson Felix, Christopher J. Penny +2 more |
2021-05-25 |
| 10957694 |
Epitaxial oxide fin segments to prevent strained semiconductor fin end relaxation |
Karthik Balakrishnan, Keith E. Fogel, Alexander Reznicek |
2021-03-23 |
| 10957583 |
Self-aligned quadruple patterning (SAQP) for routing layouts including multi-track jogs |
Sean D. Burns, Lawrence A. Clevenger, Matthew E. Colburn, Yann Mignot, Christopher J. Penny +2 more |
2021-03-23 |
| 10937867 |
Conformal doping for punch through stopper in fin field effect transistor devices |
Huiming Bu, Fee Li Lie, Tenko Yamashita |
2021-03-02 |
