Issued Patents 2020
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10859923 | Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing method | Gonzalo Roberto Sanguinetti, Murat Bozkurt, Maurits Van Der Schaar | 2020-12-08 |
| 10845707 | Determination of stack difference and correction using stack difference | Kaustuve Bhattacharyya | 2020-11-24 |
| 10816909 | Metrology system and method for determining a characteristic of one or more structures on a substrate | Patricius Aloysius Jacobus Tinnemans, Armand Eugene Albert Koolen, Nitesh Pandey, Vasco Tomas Tenner, Willem Marie Julia Marcel Coene +1 more | 2020-10-27 |
| 10816906 | HHG source, inspection apparatus and method for performing a measurement | Nan Lin, Sander Bas Roobol, Simon Gijsbert Josephus Mathijssen, Niels Geypen | 2020-10-27 |
| 10809628 | Method of designing metrology targets, substrates having metrology targets, method of measuring overlay, and device manufacturing method | Kaustuve Bhattacharyya | 2020-10-20 |
| 10809632 | Metrology apparatus and a method of determining a characteristic of interest | Ronald Joseph Antonius Van Den Oetelaar | 2020-10-20 |
| 10775704 | Method of measuring a structure, inspection apparatus, lithographic system, device manufacturing method and wavelength-selective filter for use therein | Nitesh Pandey, Marinus Johannes Maria Van Dam | 2020-09-15 |
| 10718604 | Metrology method, target and substrate | Kaustuve Bhattacharyya, Henricus Wilhelmus Maria Van Buel, Christophe David Fouquet, Hendrik Jan Hidde Smilde, Maurits Van Der Schaar +7 more | 2020-07-21 |
| 10712678 | Imprint lithography apparatus and method | Yvonne Wendela Kruijt-Stegeman, Andre Bernardus Jeunink, Vadim Yevgenyevich Banine, Michael Jozef Mathijs Renkens, Gerard Van Schothorst +5 more | 2020-07-14 |
| 10698322 | Metrology method, computer product and system | Kaustuve Bhattacharyya | 2020-06-30 |
| 10678139 | Lithographic apparatus and device manufacturing method | Joeri Lof, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra +16 more | 2020-06-09 |
| 10670975 | Adjustment of a metrology apparatus or a measurement thereby based on a characteristic of a target measured | Robert John Socha, Nitesh Pandey | 2020-06-02 |
| 10635004 | Correction using stack difference | Aiqin JIANG, Kaustuve Bhattacharyya, Hans Van Der Laan, Bart Visser, Martin Jacobus Johan Jak | 2020-04-28 |
| 10634490 | Determining edge roughness parameters | Martin Jacobus Johan Jak, Richard Quintanilha, Michael Kubis | 2020-04-28 |
| 10620550 | Metrology method and apparatus | Martin Jacobus Johan Jak, Martin Ebert, Nitesh Pandey | 2020-04-14 |
| 10591283 | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method | Henricus Petrus Maria Pellemans | 2020-03-17 |
| 10585363 | Alignment system | Simon Gijsbert Josephus Mathijssen, Alessandro Polo, Patricius Aloysius Jacobus Tinnemans, Adrianus Johannes Hendrikus Schellekens, Elahe Yeganegi Dastgerdi +3 more | 2020-03-10 |
| 10579772 | Computational wafer inspection | Christophe David Fouquet, Bernardo Kastrup, Johannes Catharinus Hubertus Mulkens, James Benedict Kavanagh, James Patrick Koonmen +1 more | 2020-03-03 |
| 10564552 | Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing method | Gonzalo Roberto Sanguinetti, Murat Bozkurt, Maurits Van Der Schaar | 2020-02-18 |
| 10527953 | Metrology recipe selection | Kaustuve Bhattacharyya, Martin Jacobus Johan Jak | 2020-01-07 |
| 10527957 | Method and apparatus for processing a substrate in a lithographic apparatus | Cayetano Sanchez-Fabres Cobaleda, Franciscus Godefridus Casper Bijnen, Edo Maria Hulsebos, Marcel Hendrikus Maria Beems, Piotr Michał Stolarz | 2020-01-07 |
| 10527949 | Metrology method, computer product and system | Kaustuve Bhattacharyya | 2020-01-07 |