Issued Patents 2020
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10866527 | Methods and apparatus for monitoring a lithographic manufacturing process | Emil Peter Schmitt-Weaver, Wim Tjibbo Tel, Frank Staals, Leon Martin Levasier | 2020-12-15 |
| 10845707 | Determination of stack difference and correction using stack difference | Arie Jeffrey Den Boef | 2020-11-24 |
| 10831111 | Metrology method and lithographic method, lithographic cell and computer program | — | 2020-11-10 |
| 10831109 | Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing method | Martin Jacobus Johan Jak | 2020-11-10 |
| 10809628 | Method of designing metrology targets, substrates having metrology targets, method of measuring overlay, and device manufacturing method | Arie Jeffrey Den Boef | 2020-10-20 |
| 10718604 | Metrology method, target and substrate | Henricus Wilhelmus Maria Van Buel, Christophe David Fouquet, Hendrik Jan Hidde Smilde, Maurits Van Der Schaar, Arie Jeffrey Den Boef +7 more | 2020-07-21 |
| 10698322 | Metrology method, computer product and system | Arie Jeffrey Den Boef | 2020-06-30 |
| 10656533 | Metrology in lithographic processes | Simon Gijsbert Josephus Mathijssen, Martin Jacobus Johan Jak | 2020-05-19 |
| 10635004 | Correction using stack difference | Aiqin JIANG, Arie Jeffrey Den Boef, Hans Van Der Laan, Bart Visser, Martin Jacobus Johan Jak | 2020-04-28 |
| 10527949 | Metrology method, computer product and system | Arie Jeffrey Den Boef | 2020-01-07 |
| 10527953 | Metrology recipe selection | Arie Jeffrey Den Boef, Martin Jacobus Johan Jak | 2020-01-07 |