Issued Patents 2020
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10831109 | Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing method | Kaustuve Bhattacharyya | 2020-11-10 |
| 10718604 | Metrology method, target and substrate | Kaustuve Bhattacharyya, Henricus Wilhelmus Maria Van Buel, Christophe David Fouquet, Hendrik Jan Hidde Smilde, Maurits Van Der Schaar +7 more | 2020-07-21 |
| 10656534 | Method of measuring, device manufacturing method, metrology apparatus, and lithographic system | Nitesh Pandey, Jin LIAN, SAMEE UR-REHMAN | 2020-05-19 |
| 10656533 | Metrology in lithographic processes | Simon Gijsbert Josephus Mathijssen, Kaustuve Bhattacharyya | 2020-05-19 |
| 10635004 | Correction using stack difference | Aiqin JIANG, Arie Jeffrey Den Boef, Kaustuve Bhattacharyya, Hans Van Der Laan, Bart Visser | 2020-04-28 |
| 10634490 | Determining edge roughness parameters | Richard Quintanilha, Arie Jeffrey Den Boef, Michael Kubis | 2020-04-28 |
| 10620550 | Metrology method and apparatus | Martin Ebert, Arie Jeffrey Den Boef, Nitesh Pandey | 2020-04-14 |
| 10551308 | Focus control arrangement and method | Armand Eugene Albert Koolen, Gerbrand Van Der Zouw, Dirk Broddin | 2020-02-04 |
| 10527953 | Metrology recipe selection | Kaustuve Bhattacharyya, Arie Jeffrey Den Boef | 2020-01-07 |