Issued Patents All Time
Showing 51–75 of 216 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10062547 | Plasma processing apparatus | Naoki Mihara, Jun Yoshikawa, Kazuo Murakami | 2018-08-28 |
| 10031027 | Optical nondestructive testing method and optical nondestructive testing apparatus | Kouya Yoshida, Ryota Umezawa, Jun Matsumoto | 2018-07-24 |
| 10007083 | Lens barrel | Kyoji Murayama | 2018-06-26 |
| 9984906 | Plasma processing device and plasma processing method | Yugo Tomita | 2018-05-29 |
| 9917004 | Group III nitride composite substrate and method for manufacturing the same, and method for manufacturing group III nitride semiconductor device | Keiji Ishibashi, Akihiro Hachigo, Yuki Hiromura, Seiji Nakahata, Fumitake Nakanishi +6 more | 2018-03-13 |
| 9805959 | Plasma processing apparatus and plasma processing method | — | 2017-10-31 |
| 9791169 | Liquid heater | Minoru Uchida, Haruyoshi Yamakawa | 2017-10-17 |
| 9778948 | Information processing apparatus, computer readable storage medium, and collecting method | Yuuji Konno | 2017-10-03 |
| 9761418 | Plasma processing apparatus | Masayuki SHINTAKU, Takashi Suzuki, Masahiko Konno, Michitaka Aita, Taizo Okada +1 more | 2017-09-12 |
| 9698352 | Amine compound and use thereof | Takanori Miyazaki, Ryohei Takahashi | 2017-07-04 |
| 9659754 | Plasma processing apparatus and plasma processing method | Jun Yoshikawa, Yoshio Susa, Peter Ventzek | 2017-05-23 |
| 9650565 | Carbazole compound and use thereof | Takanori Miyazaki, Shinichi Ishikawa | 2017-05-16 |
| 9646867 | Plasma processing apparatus, power supply unit and mounting table system | Masahiko Konno, Masayuki SHINTAKU, Takashi Suzuki, Michitaka Aita, Taizo Okada +2 more | 2017-05-09 |
| 9607866 | Capacitive coupling plasma processing apparatus and method for using the same | Chishio Koshimizu, Akira Koshiishi | 2017-03-28 |
| 9595425 | Antenna, dielectric window, plasma processing apparatus and plasma processing method | Wataru Yoshikawa, Jun Yoshikawa, Kazuki Moyama, Kiyotaka Ishibashi, Osamu Morita +1 more | 2017-03-14 |
| D773609 | Return nozzle | Shinya Morita, Masahiro Miyake, Masato Terasaki, Naonori Akae | 2016-12-06 |
| D771772 | Return nozzle | Shinya Morita, Masahiro Miyake, Masato Terasaki, Naonori Akae | 2016-11-15 |
| D771543 | Return nozzle | Shinya Morita, Masahiro Miyake, Masato Terasaki, Naonori Akae | 2016-11-15 |
| 9490105 | Plasma processing apparatus and method | Akira Koshiishi, Masaru Sugimoto, Kunihiko Hinata, Noriyuki Kobayashi, Chishio Koshimizu +11 more | 2016-11-08 |
| 9418822 | Plasma processing apparatus, plasma processing method and high frequency generator | Kazushi Kaneko, Koji Koyama, Kazunori Funazaki, Hideo Kato, Kiyotaka Ishibashi | 2016-08-16 |
| 9412565 | Temperature measuring method and plasma processing system | Yusuke Yoshida, Ryou Son, Takahiro Senda, Masayuki Kohno | 2016-08-09 |
| 9324542 | Plasma processing method and plasma processing apparatus | Yugo Tomita, Naoki Mihara, Kazuki Takahashi, Michitaka Aita, Jun Yoshikawa +5 more | 2016-04-26 |
| 9316544 | Electronic thermometer and method for manufacturing the same | Gaku Hasegawa, Takanobu Yamauchi, Atsushi Kawano, Yasuo Fujita | 2016-04-19 |
| 9312340 | Group III nitride composite substrate and method for manufacturing the same, laminated group III nitride composite substrate, and group III nitride semiconductor device and method for manufacturing the same | Makoto Kiyama, Keiji Ishibashi, Akihiro Hachigo, Fumitake Nakanishi | 2016-04-12 |
| 9312165 | Group III nitride composite substrate and method for manufacturing the same, and method for manufacturing group III nitride semiconductor device | Akihiro Hachigo, Keiji Ishibashi | 2016-04-12 |