Issued Patents All Time
Showing 101–125 of 216 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| D697038 | Baffle plate | Jun Yoshikawa | 2014-01-07 |
| 8617865 | Tannase, gene encoding same, and process for producing same | Megumi Nakagawa, Hitoshi Amano, Shotaro Yamaguchi | 2013-12-31 |
| 8603293 | Plasma processing apparatus and method | Akira Koshiishi, Masaru Sugimoto, Kunihiko Hinata, Noriyuki Kobayashi, Chishio Koshimizu +11 more | 2013-12-10 |
| D694791 | Baffle plate for manufacturing semiconductor | Jun Yoshikawa | 2013-12-03 |
| D694790 | Baffle plate for manufacturing semiconductor | Jun Yoshikawa | 2013-12-03 |
| 8592948 | Substrate, epitaxial layer provided substrate, method for producing substrate, and method for producing epitaxial layer provided substrate | — | 2013-11-26 |
| 8531187 | Compensation circuit and test apparatus | Yuji Kuwana | 2013-09-10 |
| 8513563 | Plasma processing apparatus and plasma processing method | Chishio Koshimizu, Yoshinobu Hayakawa, Hidetoshi Hanaoka, Manabu Iwata, Satoshi Tanaka | 2013-08-20 |
| 8506753 | Capacitive coupling plasma processing apparatus and method for using the same | Chishio Koshimizu, Akira Koshiishi | 2013-08-13 |
| 8471366 | Nitride semiconductor substrate | Hidenori Mikami, Hideki Osada, Yusuke Yoshizumi, Sayuri Yamaguchi | 2013-06-25 |
| 8471365 | Nitride semiconductor substrate, semiconductor device, and methods for manufacturing nitride semiconductor substrate and semiconductor device | Sayuri Yamaguchi, Hidenori Mikami | 2013-06-25 |
| 8455367 | Method of manufacturing nitride substrate for semiconductors | — | 2013-06-04 |
| 8410817 | Driver circuit | Yuji Kuwana, Yasuhiro Urabe | 2013-04-02 |
| 8404569 | Fabrication method and fabrication apparatus of group III nitride crystal substance | Hitoshi Kasai, Takuji Okahisa, Shunsuke Fujita, Hideyuki Ijiri, Fumitaka Sato +4 more | 2013-03-26 |
| 8404137 | Plasma processing apparatus and plasma processing method | Chishio Koshimizu | 2013-03-26 |
| 8368366 | Driver circuit and test apparatus | Yuji Kuwana, Yasuhiro Urabe | 2013-02-05 |
| 8343306 | Plasma processing apparatus and method of plasma distribution correction | Satoshi Tanaka, Chishio Koshimizu, Manabu Iwata, Toru Ito | 2013-01-01 |
| D672377 | Dielectric window for plasma processing device | Wataru Yoshikawa, Jun Yoshikawa | 2012-12-11 |
| 8298371 | Plasma processing apparatus | Chishio Koshimizu, Satoshi Tanaka, Toru Ito | 2012-10-30 |
| 8268643 | Substrate, epitaxial layer provided substrate, method for producing substrate, and method for producing epitaxial layer provided substrate | — | 2012-09-18 |
| 8183669 | Nitride semiconductor wafer having a chamfered edge | Keiji Ishibashi, Hidenori Mikami | 2012-05-22 |
| 8141514 | Plasma processing apparatus, plasma processing method, and storage medium | Masanobu Honda, Satoshi Tanaka, Yutaka Matsui | 2012-03-27 |
| 8138445 | Plasma processing apparatus and plasma processing method | Chishio Koshimizu, Yoshinobu Hayakawa, Hidetoshi Hanaoka, Manabu Iwata, Satoshi Tanaka | 2012-03-20 |
| 8137471 | Plasma processing apparatus and method | Akira Koshiishi, Masaru Sugimoto, Kunihiko Hinata, Noriyuki Kobayashi, Chishio Koshimizu +6 more | 2012-03-20 |
| 8117749 | Process for producing metallic gasket | Hiroyuki Nikamoto, Toshihiro Higashira, Namieki Oosawa, Tomonori Funatsu | 2012-02-21 |