Issued Patents All Time
Showing 76–97 of 97 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7462571 | Film formation method and apparatus for semiconductor process for forming a silicon nitride film | Mitsuhiro Okada, Pao-Hwa Chou, Chaeho Kim, Jun Ogawa | 2008-12-09 |
| 7452826 | Oxidation method and oxidation system | Kota Umezawa, Yutaka Takahashi | 2008-11-18 |
| 7427572 | Method and apparatus for forming silicon nitride film | Mitsuhiro Okada | 2008-09-23 |
| 7416978 | Film forming method, film forming system and recording medium | Mitsuhiro Okada | 2008-08-26 |
| 7351668 | Film formation method and apparatus for semiconductor process | Pao-Hwa Chou | 2008-04-01 |
| 7300885 | Film formation apparatus and method for semiconductor process | Pao-Hwa Chou | 2007-11-27 |
| 7273818 | Film formation method and apparatus for semiconductor process | Masaki Kurokawa, Norifumi Kimura, Takehiko Fujita, Yoshikazu Furusawa, Katsuhiko Komori | 2007-09-25 |
| 7229917 | Film formation method and apparatus for semiconductor process | Takahito Umehara, Masahiko Tomita, Hirotake Fujita | 2007-06-12 |
| 7220461 | Method and apparatus for forming silicon oxide film | Atsushi Endoh, Daisuke Suzuki, Keisuke Suzuki | 2007-05-22 |
| 7211514 | Heat-processing method for semiconductor process under a vacuum pressure | Takehiko Fujita, Akitake Tamura, Keisuke Suzuki, Mitsuhiro Okada | 2007-05-01 |
| 7144823 | Thermal treatment apparatus | Takanori Saito, Toshiyuki Makiya, Hisaei Osanai, Tsuyoshi Takizawa, Tomohisa Shimazu +3 more | 2006-12-05 |
| 7129186 | Oxidation method and oxidation system | Kota Umezawa, Yutaka Takahashi | 2006-10-31 |
| 7125811 | Oxidation method for semiconductor process | Keisuke Suzuki, Toshiyuki Ikeuchi | 2006-10-24 |
| 7041546 | Film forming method for depositing a plurality of high-k dielectric films | Yuichiro Morozumi, Shigeru Nakajima, Haruhiko Furuya, Dong-Kyun Choi, Takahito Umehara +3 more | 2006-05-09 |
| 6599845 | Oxidizing method and oxidation system | Shoichi Sato, Kota Umezawa | 2003-07-29 |
| 6344387 | Wafer boat and film formation method | Atsumi Ito, Kenji Tago, Teruyuki Hayashi | 2002-02-05 |
| 6313047 | MOCVD method of tantalum oxide film | Yuichiro Morozumi, Dong-Kyun Choi, Takuya Sugawara, Seiji Inumiya, Yoshitaka Tsunashima | 2001-11-06 |
| 6156121 | Wafer boat and film formation method | Atsumi Ito, Kenji Tago | 2000-12-05 |
| 5818596 | Film thickness measuring apparatus | Masayuki Imai, Masaaki Amemiya, Norihito Kaneko | 1998-10-06 |
| 5783257 | Method for forming doped polysilicon films | Seiichi Shishiguchi, Nobuaki Shigematsu | 1998-07-21 |
| 5677235 | Method for forming silicon film | Toshiharu Nishimura | 1997-10-14 |
| 5458685 | Vertical heat treatment apparatus | Nobuaki Takahashi, Keiji Sukekawa | 1995-10-17 |