Issued Patents All Time
Showing 76–100 of 125 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11520243 | Lithography system and method thereof | Shao-Hua Wang, Chueh-Chi Kuo, Kuei-Lin Ho, Zong-You YANG, Cheng-Wei Sun +3 more | 2022-12-06 |
| 11500299 | Exposure method and exposure apparatus | Yung-Yao Lee, Hung-Ming Kuo, Jui-Chun Peng | 2022-11-15 |
| 11442365 | EUV photolithography system and methods of operating the same | Yu-Kuang SUN, Ming-Hsun Tsai, Yu-Huan Chen, Wei-Shin Cheng, Cheng-Hao LAI +6 more | 2022-09-13 |
| 11437161 | Lithography apparatus and method for using the same | Chun-Lin Chang, Chieh Hsieh, Shang-Chieh Chien, Han-Lung Chang, Li-Jui Chen +1 more | 2022-09-06 |
| 11392040 | System and method for performing extreme ultraviolet photolithography processes | Tai-Yu Chen, Sagar Deepak Khivsara, Kuo-An Liu, Chieh Hsieh, Shang-Chieh Chien +5 more | 2022-07-19 |
| 11392041 | Particle removal device and method | Cheng-Hsuan Wu, Ming-Hsun Tsai, Shang-Chieh Chien, Li-Jui Chen | 2022-07-19 |
| 11162777 | Wafer alignment mark scheme | Wei-Hsiang Tseng, Chin-Hsiang Lin, Jui-Chun Peng, Ho-Ping Chen | 2021-11-02 |
| 11153957 | Apparatus and method for generating an electromagnetic radiation | Tzu-Jeng Hsu, Chi-Ming Yang, Chyi Shyuan Chern, Jui-Chun Peng, Chin-Hsiang Lin | 2021-10-19 |
| 10831110 | Lithographic overlay correction and lithographic process | Ai-Jen Hung, Yung-Yao Lee, Chin-Chen Wang, Ying-Ying Wang | 2020-11-10 |
| 10747128 | Exposure method and exposure apparatus | Yung-Yao Lee, Hung-Ming Kuo, Jui-Chun Peng | 2020-08-18 |
| 10514247 | Wafer alignment mark scheme | Wei-Hsiang Tseng, Chin-Hsiang Lin, Jui-Chun Peng, Ho-Ping Chen | 2019-12-24 |
| 10061215 | Patterning method and patterning apparatus for fabricating a resist pattern | Yung-Yao Lee, Jui-Chun Peng, Ho-Ping Chen | 2018-08-28 |
| 9978625 | Semiconductor method and associated apparatus | Yung-Yao Lee, Jui-Chun Peng, Ho-Ping Chen | 2018-05-22 |
| 9863754 | Wafer alignment mark scheme | Wei-Hsiang Tseng, Chin-Hsiang Lin, Jui-Chun Peng, Ho Ping Cheng | 2018-01-09 |
| 9841687 | Synchronized integrated metrology for overlay-shift reduction | Yung-Yao Lee, Jui-Chun Peng, Yung-Cheng Chen | 2017-12-12 |
| 9814097 | Baking apparatus for priming substrate | Chien-Hung Wang, Ren-Jyh Leu, Shang-Wern Chang | 2017-11-07 |
| 9781773 | Method of heating/cooling a substrate | Jui-Chun Peng, Jacky Chung, Chun-Hung Lin | 2017-10-03 |
| 9772561 | Semiconductor manufacturing method and tool | Yung-Yao Lee, Yi-Ping Hsieh, Ying-Ying Wang | 2017-09-26 |
| 9766559 | Edge-dominant alignment method in exposure scanner system | Yung-Yao Lee, Ying-Ying Wang, Yi-Ping Hsieh | 2017-09-19 |
| 9709904 | Lithography apparatus having dual reticle edge masking assemblies and method of use | Tung-Li Wu, Chin-Hsiang Lin, Jui-Chun Peng | 2017-07-18 |
| 9658536 | In-line inspection and clean for immersion lithography | Tung-Li Wu, Jui-Chun Peng | 2017-05-23 |
| 9640487 | Wafer alignment mark scheme | Wei-Hsiang Tseng, Chao-Hsiung Wang, Chin-Hsiang Lin, Ho-Ping Chen, Jui-Chun Peng | 2017-05-02 |
| 9601324 | Method of making wafer assembly | I-Hsiung Huang, Heng-Jen Lee, Chin-Hsiang Lin | 2017-03-21 |
| 9587929 | Focus metrology method and photolithography method and system | Hung-Ming Kuo, Jui-Chun Peng, Yung-Yao Lee | 2017-03-07 |
| 9563946 | Overlay metrology method and overlay control method and system | Yung-Yao Lee, Ying-Ying Wang, Shang-Wern Chang | 2017-02-07 |