Issued Patents All Time
Showing 101–125 of 125 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9466101 | Detection of defects on wafer during semiconductor fabrication | Chun-Hsien Lin, Liu Bo-Tsun, Chin-Ti Ko, Wu Cheng-Hung, Kuo-Hung Chao +3 more | 2016-10-11 |
| 9282592 | Rotatable heating-cooling plate and element in proximity thereto | Jui-Chun Peng, Jacky Chung, Chun-Hung Lin | 2016-03-08 |
| 9228827 | Flexible wafer leveling design for various orientation of line/trench | Kuo-Hung Chao, Jui-Chun Peng | 2016-01-05 |
| 9196515 | Litho cluster and modulization to enhance productivity | I-Hsiung Huang, Heng-Jen Lee, Chin-Hsiang Lin | 2015-11-24 |
| 9188876 | Method of determining overlay error and control system for dynamic control of reticle position | Yung-Yao Lee, Sophia Wang, Fei-Gwo Tsai | 2015-11-17 |
| 9164398 | Overlay metrology method | Yung-Yao Lee, Ying-Ying Wang, Yi-Ping Hsieh | 2015-10-20 |
| 9123583 | Overlay abnormality gating by Z data | Chun-Hsien Lin, Kuo-Hung Chao, Yi-Ping Hsieh, Yen-Di Tsen, Jui-Chun Peng +1 more | 2015-09-01 |
| 9111982 | Wafer assembly with carrier wafer | I-Hsiung Huang, Heng-Jen Lee, Chin-Hsiang Lin | 2015-08-18 |
| 9081297 | Lithography apparatus having dual reticle edge masking assemblies and method of use | Tung-Li Wu, Chin-Hsiang Lin, Jui-Chun Peng | 2015-07-14 |
| 8906599 | Enhanced scanner throughput system and method | Yu-Mei Liu, Chin-Hsiang Lin, Heng-Jen Lee, I-Hsiung Huang, Chih-Wei Lin | 2014-12-09 |
| 8903532 | Litho cluster and modulization to enhance productivity | I-Hsiung Huang, Heng-Jen Lee, Chin-Hsiang Lin | 2014-12-02 |
| 8860941 | Tool induced shift reduction determination for overlay metrology | Yung-Yao Lee, Ying-Ying Wang, Heng-Jen Lee | 2014-10-14 |
| 8703368 | Lithography process | Yung-Yao Lee, Ying-Ying Wang, Chin-Hsiang Lin | 2014-04-22 |
| 8674355 | Integrated circuit test units with integrated physical and electrical test regions | Huan Chi Tseng, Shu-Cheng Kuo, Chien-Chang Lee, Chun-Hung Lin | 2014-03-18 |
| 8592287 | Overlay alignment mark and method of detecting overlay alignment error using the mark | Chi-Yuan Shih, I-Hsiung Huang | 2013-11-26 |
| 8199314 | System and method for improving immersion scanner overlay performance | Jui-Chung Peng, Tzung-Chi Fu, Chin-Hsiang Lin, Chien-Hsun Lin, Chun-Hung Lin +2 more | 2012-06-12 |
| 8183701 | Structure of stacking scatterometry based overlay marks for marks footprint reduction | Chi-Yuan Shih, Sophia Wang, Heng-Jen Lee | 2012-05-22 |
| 8101530 | Lithography patterning method | I-Hsiung Huang, Chin-Hsiang Lin, Heng-Jen Lee | 2012-01-24 |
| 8068208 | System and method for improving immersion scanner overlay performance | Jui-Chung Peng, Tzung-Chi Fu, Chin-Hsiang Lin, Chien-Hsun Lin, Chun-Hung Lin +2 more | 2011-11-29 |
| 7901854 | Wafer edge exposure unit | Po-Chang Huang, Heng-Jen Lee | 2011-03-08 |
| 7796249 | Mask haze early detection | Wen-Chuan Wang, Shy-Jay Lin, Te-Chih Huang, Chih-Ming Ke, Wei-Yu Su +2 more | 2010-09-14 |
| 7571021 | Method and system for improving critical dimension uniformity | Chun-Hung Lin, Shy-Jay Lin, Chien-Hsun Lin, Jui-Chung Peng, Yao-Wen Guo | 2009-08-04 |
| 7333173 | Method to simplify twin stage scanner OVL machine matching | Shun-Jiang Chiang, Chi-Hung Liao | 2008-02-19 |
| 5904570 | Method for polymer removal after etching | Sen-Fu Chen, Bao Ru Yang, Wen-Cheng Chang | 1999-05-18 |
| 5639342 | Method of monitoring and controlling a silicon nitride etch step | Sen-Fu Chen, Wen-Cheng Chang, Bao Ru Yang | 1997-06-17 |