Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6682659 | Method for forming corrosion inhibited conductor layer | Ching-Wen Cho, Kuwi-Jen Chang, Kuang-Peng Lin, Shing-Jzy Tay, Szu-Hung Yang +6 more | 2004-01-27 |
| 6627971 | Polysilicon structures with different resistance values for gate electrodes, resistors, and capacitor plates | Chih-Heng Shen, Huan-Wen Wang, Ying-Tzu Yen | 2003-09-30 |
| 6624466 | Implant method for forming Si3N4 spacer | Ching-Wen Cho, Huan-Wen Wang, Chih-Heng Shen | 2003-09-23 |
| 6394104 | Method of controlling and improving SOG etchback etcher | Ming-Chieh Yeh | 2002-05-28 |
| 6380030 | Implant method for forming Si3N4 spacer | Ching-Wen Cho, Huan-Wen Wang, Chih-Heng Shen | 2002-04-30 |
| 6320269 | Method for preparing a semiconductor wafer to receive a protective tape | Kuei-Jen Chang | 2001-11-20 |
| 6232172 | Method to prevent auto-doping induced threshold voltage shift | Yuan-Ko Hwang, Huan-Wen Wang | 2001-05-15 |
| 6211031 | Method to produce dual polysilicon resistance in an integrated circuit | Dah-Chih Lin, Chin-Heng Shen | 2001-04-03 |
| 6162584 | Method of fabricating polysilicon structures with different resistance values for gate electrodes, resistors and capacitor plates in an integrated circuit | Chih-Heng Shen | 2000-12-19 |
| 6143474 | Method of fabricating polysilicon structures with different resistance values for gate electrodes, resistors, and capacitor plates | Chih-Heng Shen, Huan-Wen Wang, Ying-Tzu Yen | 2000-11-07 |
| 6093629 | Method of simplified contact etching and ion implantation for CMOS technology | — | 2000-07-25 |
| 6077776 | Polysilicon residue free process by thermal treatment | Ching-Wen Cho, Cheng-Fu Hsu, Po-Tao Chu | 2000-06-20 |
| 6071826 | Method of manufacturing CMOS image sensor leakage free with double layer spacer | Ching-Wen Cho, Hua Yang, Chih-Heng Shen, Wen-Cheng Chien, Chang-Jen Wu +2 more | 2000-06-06 |
| 6001538 | Damage free passivation layer etching process | Jie Wu, Fang Chen, Tsung Tser Lee | 1999-12-14 |
| 5904570 | Method for polymer removal after etching | Bao Ru Yang, Wen-Cheng Chang, Heng-Hsin Liu | 1999-05-18 |
| 5763316 | Substrate isolation process to minimize junction leakage | Bao Ru Yang, Wen-Cheng Chang | 1998-06-09 |
| 5719087 | Process for bonding pad protection from damage | Jie Wu, Po-Tau Chu, Wen-Cheng Chang | 1998-02-17 |
| 5639342 | Method of monitoring and controlling a silicon nitride etch step | Wen-Cheng Chang, Heng-Hsin Liu, Bao Ru Yang | 1997-06-17 |
| 5633210 | Method for forming damage free patterned layers adjoining the edges of high step height apertures | Bao Ru Yang, Wen-Cheng Chang, Po-Tau Chu | 1997-05-27 |