Issued Patents All Time
Showing 1–25 of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11935951 | Metal-insensitive epitaxy formation | Chun Hsiung Tsai | 2024-03-19 |
| 11495685 | Metal-insensitive epitaxy formation | Chun Hsiung Tsai | 2022-11-08 |
| 10804395 | Metal-insensitive epitaxy formation | Chun Hsiung Tsai | 2020-10-13 |
| 10263108 | Metal-insensitive epitaxy formation | Chun Hsiung Tsai | 2019-04-16 |
| 10134694 | Method of forming redistribution layer | Chih-Fei Lee, Fu-Cheng Chang, Chi-Cherng Jeng, Hsin-Chi Chen | 2018-11-20 |
| 9373594 | Under bump metallization | Chih-Fei Lee, Fu-Cheng Chang, Chi-Cherng Jeng, Hsin-Chi Chen | 2016-06-21 |
| 7576374 | Semiconductor device with robust polysilicon fuse | Yuan-Pang Lee, Chen-Shiang Shieh, Ping-Hung Yin, Fei-Yun Chen | 2009-08-18 |
| 7384799 | Method to avoid amorphous-si damage during wet stripping processes in the manufacture of MEMS devices | Fei-Yun Chen, Ni-Hwi Kuan, Yuh-Hwa Chang, Yuan-Pang Lee, Shuh-Shun Chen | 2008-06-10 |
| 7144673 | Effective photoresist stripping process for high dosage and high energy ion implantation | Fei-Yun Chen, Jen-Shian Shieh, Hao Yuan, Shih-Shiung Chen | 2006-12-05 |
| 7083897 | Method of fabricating a poly fuse | Yuan-Pang Lee, Chen-Shiang Shieh, Ping-Hung Yin, Fei-Yun Chen | 2006-08-01 |
| 6908813 | Method of forming tiny silicon nitride spacer for flash EPROM by fully wet etching technology | Hung-Hsin Liu, Kuei-Jen Chang, Tsung-Chi Hsieh, Shih Chiung Chen | 2005-06-21 |
| 6723654 | Method and apparatus for in-situ descum/hot bake/dry etch photoresist/polyimide layer | Kuei-Jen Chang, Juei-Wen Lin, Jen-Yung Tseng | 2004-04-20 |
| 6706601 | Method of forming tiny silicon nitride spacer for flash EPROM by using dry+wet etching technology | Hung-Hsin Liu, Kwang-Chen Wu, How-Cheng Tsai, Shih-Shun Chen | 2004-03-16 |
| 6617221 | Method of making capacitors | Hao Yuan, Nan-Huan Kuan, Shih-Shiung Chen | 2003-09-09 |
| 6489227 | Method of etching a polysilicon layer during the stripping of the photoresist shape used as an etch mask to create an opening to an underlying fuse structure | Tsung-Chi Hsieh, Juei-Wen Lin, Kuei-Jen Chang | 2002-12-03 |
| 6256825 | Removal of particulate contamination in loadlocks | — | 2001-07-10 |
| 6238160 | Method for transporting and electrostatically chucking a semiconductor wafer or the like | Tsung-Chi Hsieh | 2001-05-29 |
| 6232172 | Method to prevent auto-doping induced threshold voltage shift | Sen-Fu Chen, Huan-Wen Wang | 2001-05-15 |
| 6185085 | System for transporting and electrostatically chucking a semiconductor wafer or the like | Tsung-Chi Hsieh | 2001-02-06 |
| 6157867 | Method and system for on-line monitoring plasma chamber condition by comparing intensity of certain wavelength | Ching-Wen Cho | 2000-12-05 |
| 6117348 | Real time monitoring of plasma etching process | YUNG-SUNG PENG, Tsung Tser Lee, Jeng Kuen Lu | 2000-09-12 |
| 6030489 | Apparatus for controlling etch rate when using consumable electrodes during plasma etching | — | 2000-02-29 |
| 6024831 | Method and apparatus for monitoring plasma chamber condition by observing plasma stability | Ying-Chen Chao | 2000-02-15 |
| 6024828 | Spin-on-glass etchback uniformity improvement using hot backside helium | — | 2000-02-15 |
| 5955383 | Method for controlling etch rate when using consumable electrodes during plasma etching | — | 1999-09-21 |