Issued Patents All Time
Showing 26–48 of 48 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6770852 | Critical dimension variation compensation across a wafer by means of local wafer temperature control | — | 2004-08-03 |
| 6721162 | Electrostatic chuck having composite dielectric layer and method of manufacture | Edwin C. Weldon, Kenneth S. Collins, Arik Donde, Brian Lue, Dan Maydan +8 more | 2004-04-13 |
| 6632322 | Switched uniformity control | Richard A. Gottscho | 2003-10-14 |
| 6444083 | Corrosion resistant component of semiconductor processing equipment and method of manufacturing thereof | Chris Chang | 2002-09-03 |
| 6414834 | Dielectric covered electrostatic chuck | Edwin C. Weldon, Kenneth S. Collins, Arik Donde, Brian Lue, Dan Maydan +8 more | 2002-07-02 |
| 6170428 | Symmetric tunable inductively coupled HDP-CVD reactor | Fred C. Redeker, Farhad Moghadam, Hiroji Hanawa, Tetsuya Ishikawa, Dan Maydan +5 more | 2001-01-09 |
| 6108189 | Electrostatic chuck having improved gas conduits | Edwin C. Weldon, Kenneth S. Collins, Arik Donde, Brian Lue, Dan Maydan +8 more | 2000-08-22 |
| 5904776 | Conduits for flow of heat transfer fluid to the surface of an electrostatic chuck | Arik Donde, Dan Maydan, Edwin C. Weldon, Brian Lue, Timothy Dyer | 1999-05-18 |
| 5788799 | Apparatus and method for cleaning of semiconductor process chamber surfaces | Fred C. Redeker | 1998-08-04 |
| 5730803 | Apparatus and method for transferring heat from a hot electrostatic chuck to an underlying cold body | James Tsuneo Taoka, Gregory Shmunis | 1998-03-24 |
| 5720818 | Conduits for flow of heat transfer fluid to the surface of an electrostatic chuck | Arik Donde, Dan Maydan, Edwin C. Weldon, Brian Lue, Timothy Dyer | 1998-02-24 |
| 5715132 | Method and structure for improving gas breakdown resistance and reducing the potential of arcing in an electrostatic chuck | Brian Lue | 1998-02-03 |
| 5644467 | Method and structure for improving gas breakdown resistance and reducing the potential of arcing in a electrostatic chuck | Brian Lue | 1997-07-01 |
| 5567909 | Method for supporting a wafer in a combined wafer support and temperature monitoring device | Michael Sugarman, Michael Beesely, Shannon J. Kelsey | 1996-10-22 |
| 5534108 | Method and apparatus for altering magnetic coil current to produce etch uniformity in a magnetic field-enhanced plasma reactor | Xue-Yu Qian, Gerald Yin, Graham W. Hills | 1996-07-09 |
| 5522131 | Electrostatic chuck having a grooved surface | — | 1996-06-04 |
| 5494523 | Controlling plasma particulates by contouring the plasma sheath using materials of differing RF impedances | Charles S. Rhoades, Anand Gupta | 1996-02-27 |
| 5356486 | Combined wafer support and temperature monitoring device | Michael Sugarman, Michael Beesely, Shannon J. Kelsey | 1994-10-18 |
| 5308417 | Uniformity for magnetically enhanced plasma chambers | David W. Groechel, Masato Toshima, Jerry Wong, Tetsuya Ishikawa, Regga Tekeste +2 more | 1994-05-03 |
| 5292399 | Plasma etching apparatus with conductive means for inhibiting arcing | Terrance Y. Lee, Fred C. Redeker, Petru N. Nitescu, David W. Groechel, Semyon Sherstinsky +2 more | 1994-03-08 |
| 5268200 | Method of forming plasma etch apparatus with conductive coating on inner metal surfaces of chamber to provide protection from chemical corrosion | — | 1993-12-07 |
| 5100502 | Semiconductor wafer transfer in processing systems | Steven Murdoch, Mahasukh Vora | 1992-03-31 |
| 5085727 | Plasma etch apparatus with conductive coating on inner metal surfaces of chamber to provide protection from chemical corrosion | — | 1992-02-04 |