Issued Patents All Time
Showing 26–50 of 54 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7901930 | High voltage nanosecond pulse generator using fast recovery diodes for cell electro-manipulation | Martin A. Gundersen | 2011-03-08 |
| 7858898 | Bevel etcher with gap control | Andrew D. Bailey, III, Alan M. Schoepp, Gregory Sexton, Yunsang Kim, William S. Kennedy | 2010-12-28 |
| 7811410 | Matching circuit for a complex radio frequency (RF) waveform | Andres Leming, Thomas W. Anderson | 2010-10-12 |
| 7767433 | High voltage nanosecond pulse generator using fast recovery diodes for cell electro-manipulation | Martin A. Gundersen | 2010-08-03 |
| 7691278 | Apparatus for the removal of a fluorinated polymer from a substrate and methods therefor | Hyungsuk Alexander Yoon, John M. Boyd, Andrew D. Bailey, III | 2010-04-06 |
| 7632375 | Electrically enhancing the confinement of plasma | Jisoo Kim, Eric H. Lenz, Rajindar Dhindsa, Lumin Li, Reza Sadjadi | 2009-12-15 |
| 7611640 | Minimizing arcing in a plasma processing chamber | Arthur M. Howald, Andrew D. Bailey, III, Butch Berney | 2009-11-03 |
| 7480571 | Apparatus and methods for improving the stability of RF power delivery to a plasma load | Arthur M. Howald, Andrew D. Bailey, III | 2009-01-20 |
| 7413673 | Method for adjusting voltage on a powered Faraday shield | Shrikant Lohokare, Andrew D. Bailey, III | 2008-08-19 |
| 7326581 | System, method and apparatus for automatic control of an RF generator for maximum efficiency | Thomas W. Anderson | 2008-02-05 |
| 7193173 | Reducing plasma ignition pressure | Mark Wiepking, Bradford J. Lyndaker, Andreas Fischer | 2007-03-20 |
| 7086347 | Apparatus and methods for minimizing arcing in a plasma processing chamber | Arthur M. Howald, Andrew D. Bailey, III, Butch Berney | 2006-08-08 |
| 6998349 | System, method and apparatus for automatic control of an RF generator for maximum efficiency | Thomas W. Anderson | 2006-02-14 |
| 6995067 | Megasonic cleaning efficiency using auto-tuning of an RF generator at constant maximum efficiency | John M. Boyd, Michael G. R. Smith, Thomas W. Anderson, William Thie | 2006-02-07 |
| 6974550 | Apparatus and method for controlling the voltage applied to an electrostatic shield used in a plasma generator | Neil Benjamin | 2005-12-13 |
| 6876155 | Plasma processor apparatus and method, and antenna | Arthur M. Howald | 2005-04-05 |
| 6842147 | Method and apparatus for producing uniform processing rates | Arthur M. Howald, Mark Wilcoxson, Andrew D. Bailey, III | 2005-01-11 |
| 6841943 | Plasma processor with electrode simultaneously responsive to plural frequencies | Vahid Vahedi, Peter Loewenhardt, Albert R. Ellingboe, Andreas Fischer | 2005-01-11 |
| 6838832 | Apparatus and methods for improving the stability of RF power delivery to a plasma load | Arthur M. Howald, Andrew D. Bailey, III | 2005-01-04 |
| 6653791 | Method and apparatus for producing uniform process rates | Andrew D. Bailey, III, Alan M. Schoepp | 2003-11-25 |
| 6592710 | Apparatus for controlling the voltage applied to an electrostatic shield used in a plasma generator | Neil Benjamin | 2003-07-15 |
| 6562190 | System, apparatus, and method for processing wafer using single frequency RF power in plasma processing chamber | Andreas Fischer | 2003-05-13 |
| 6518705 | Method and apparatus for producing uniform process rates | Mark Wilcoxson, Andrew D. Bailey, III, Michael G. R. Smith, Alan M. Schoepp | 2003-02-11 |
| 6341574 | Plasma processing systems | Andrew D. Bailey, III, Alan M. Schoepp, David Hemker, Mark Wilcoxson | 2002-01-29 |
| 6320320 | Method and apparatus for producing uniform process rates | Andrew D. Bailey, III, Alan M. Schoepp | 2001-11-20 |