Issued Patents All Time
Showing 1–25 of 44 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10354832 | Multi-column scanning electron microscopy system | Robert Haynes, John Gerling, Aron Welk, Christopher Sears, Felipe Fuks +1 more | 2019-07-16 |
| 9793089 | Electron emitter device with integrated multi-pole electrode structure | Thomas Plettner | 2017-10-17 |
| 9679372 | Apparatus and methods for inspecting extreme ultra violet reticles | Stanley Stokowski, Mehdi Vaez-Iravani | 2017-06-13 |
| 9591770 | Multi-layer ceramic vacuum to atmosphere electric feed through | Robert Haynes | 2017-03-07 |
| 9513230 | Apparatus and method for optical inspection, magnetic field and height mapping | John Gerling, Edward Wagner, Garrett Pickard, Tomas Plettner, Robert Haynes +1 more | 2016-12-06 |
| 9418819 | Asymmetrical detector design and methodology | John Gerling, Tomas Plettner | 2016-08-16 |
| 8953869 | Apparatus and methods for inspecting extreme ultra violet reticles | Stanley Stokowski, Mehdi Vaez-Iravani | 2015-02-10 |
| 8890066 | Sharp scattering angle trap for electron beam apparatus | Yehiel Gotkis, Garrett Pickard, Stanislaw Marek Borowicz, Tzu-Chin Chuang | 2014-11-18 |
| 8765496 | Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis | Mark Borowicz, Dave Bakker, Mehdi Vaez-Iravani, Prashant Aji, Rudy F. Garcia +1 more | 2014-07-01 |
| 8698094 | Permanent magnet lens array | Christopher Sears, Khashayar Shadman | 2014-04-15 |
| 8658973 | Auger elemental identification algorithm | Mark A. Neil, Christopher Sears | 2014-02-25 |
| 8633457 | Background reduction system including louver | Christopher Sears, Robert Haynes | 2014-01-21 |
| 8618513 | Apparatus and methods for forming an electrical conduction path through an insulating layer | Tomas Plettner, Robert Haynes, Rudy F. Garcia | 2013-12-31 |
| 8530867 | Electron generation and delivery system for contamination sensitive emitters | — | 2013-09-10 |
| 8513619 | Non-planar extractor structure for electron source | Tomas Plettner, Robert Haynes, Christopher Sears | 2013-08-20 |
| 8455838 | Multiple-column electron beam apparatus and methods | Khashayar Shadman, Robert Haynes, Christopher Sears | 2013-06-04 |
| 8283631 | In-situ differential spectroscopy | Mehdi Vaez-Iravani, Guoheng Zhao | 2012-10-09 |
| 8237120 | Transverse focusing action in hyperbolic field detectors | Gabor Toth, Rudy F. Garcia, Khashayar Shadman, Ming Lun Yu, Stuart L. Friedman | 2012-08-07 |
| 8202440 | Methods and apparatus for electron beam assisted etching at low temperatures | Ying Wang, Harrison H. Chin, Anne Testoni, R. Chris Burns | 2012-06-19 |
| 8188451 | Electron generation and delivery system for contamination sensitive emitters | — | 2012-05-29 |
| 8008207 | Use of ion implantation in chemical etching | Ming Lun Yu | 2011-08-30 |
| 7945086 | Tungsten plug deposition quality evaluation method by EBACE technology | Yehiel Gotkis, Sergey Lopatin | 2011-05-17 |
| 7855362 | Contamination pinning for auger analysis | Alan D. Brodie | 2010-12-21 |
| 7838833 | Apparatus and method for e-beam dark imaging with perspective control | Matthew Lent, Stanislaw Marek Borowicz, Niles K. MacDonald, Ye Yang, Kenneth Krzeczowski | 2010-11-23 |
| 7828622 | Sharpening metal carbide emitters | Alan D. Brodie, Ming Lun Yu | 2010-11-09 |