NM

Niles K. MacDonald

KL Kla-Tencor: 5 patents #566 of 1,394Top 45%
ET Enki Technology: 1 patents #11 of 15Top 75%
GI Gasonics International: 1 patents #6 of 17Top 40%
RE Reflectivity: 1 patents #19 of 27Top 75%
TI Texas Instruments: 1 patents #7,357 of 12,488Top 60%
📍 Los Gatos, CA: #756 of 2,986 inventorsTop 30%
🗺 California: #60,666 of 386,348 inventorsTop 20%
Overall (All Time): #515,334 of 4,157,543Top 15%
10
Patents All Time

Issued Patents All Time

Showing 1–10 of 10 patents

Patent #TitleCo-InventorsDate
8668960 Flow coating apparatus and method of coating Ramasubrahmaniam Hanumanthu, Patrick J. Neyman, Brenor L. Brophy, Kevin Kopczynski, Vinod Nair 2014-03-11
8052885 Structural modification using electron beam activated chemical etch Mehran Naser-Ghodsi, Garrett Pickard, Rudy F. Garcia, Ming Lun Yu, Kenneth Krzeczowski +3 more 2011-11-08
7879730 Etch selectivity enhancement in electron beam activated chemical etch Mehran Naser-Ghodsi, Garrett Pickard, Rudy F. Garcia, Tzu-Chin Chuang, Ming Lun Yu +4 more 2011-02-01
7838833 Apparatus and method for e-beam dark imaging with perspective control Matthew Lent, Stanislaw Marek Borowicz, Mehran Nasser-Ghodsi, Ye Yang, Kenneth Krzeczowski 2010-11-23
7755042 Auger electron spectrometer with applied magnetic field at target surface Gabor Toth, Rudy F. Garcia, Chris Huang, Mehran Nasser-Ghodsi, Garrett Pickard +3 more 2010-07-13
7612348 Transverse magnetic field voltage isolator Alexander Jozef Gubbens, Mehran Nasser-Ghodsi, Rudy F. Garcia, Doug K. Masnaghetti 2009-11-03
7394339 Transverse magnetic field voltage isolator Alexander Jozef Gubbens, Mehran Nasser-Ghodsi, Rudy F. Garcia, Doug K. Masnaghetti 2008-07-01
7189332 Apparatus and method for detecting an endpoint in a vapor phase etch Satyadev Patel, Gregory P. Schaadt, Douglas B. MacDonald, Hongqin Shi 2007-03-13
6949202 Apparatus and method for flow of process gas in an ultra-clean environment Satyadev Patel, Gregory P. Schaadt, Douglas B. MacDonald 2005-09-27
6175095 Resonant impedance-matching slow-wave ring structure microwave applicator for plasmas Terry L. White, James W. Caughran 2001-01-16