Issued Patents All Time
Showing 1–25 of 32 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12322660 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma +1 more | 2025-06-03 |
| 12142535 | Method and apparatus to determine a patterning process parameter using a unit cell having geometric symmetry | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma +1 more | 2024-11-12 |
| 12007697 | Method for process metrology | Bert Verstraeten, Hugo Augustinus Joseph Cramer | 2024-06-11 |
| 11947269 | Method and apparatus to determine a patterning process parameter | Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Maria Isabel De La Fuente Valentin, Mir Homayoun Shahrjerdy +2 more | 2024-04-02 |
| 11784098 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma +1 more | 2023-10-10 |
| 11733606 | Method for performing a manufacturing process and associated apparatuses | Koenraad VAN INGEN SCHENAU, Pieter J. Woltgens | 2023-08-22 |
| 11728224 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma +1 more | 2023-08-15 |
| 11710668 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma +5 more | 2023-07-25 |
| 11520239 | Separation of contributions to metrology data | Wim Tjibbo Tel, Frank Staals, Mark John Maslow, Roy ANUNCIADO, Marinus Jochemsen +2 more | 2022-12-06 |
| 11385551 | Method for process metrology | Bert Verstraeten, Hugo Augustinus Joseph Cramer | 2022-07-12 |
| 11378891 | Method for determining contribution to a fingerprint | Davit Harutyunyan, Fei Jia, Frank Staals, Fuming Wang, Hugo Thomas Looijestijn +8 more | 2022-07-05 |
| 11314174 | Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method | Laurentius Cornelius De Winter, Roland Pieter Stolk, Frank Staals, Anton Bernhard Van Oosten, Paul Christiaan Hinnen +2 more | 2022-04-26 |
| 11143972 | Method and apparatus to determine a patterning process parameter | Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Maria Isabel De La Fuente Valentin, Mir Homayoun Shahrjerdy +2 more | 2021-10-12 |
| 11145557 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma +1 more | 2021-10-12 |
| 11137695 | Method of determining a height profile, a measurement system and a computer readable medium | Arend Johannes Donkerbroek, Jeroen COTTAAR, Erik Johan Koop | 2021-10-05 |
| 11101185 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma +1 more | 2021-08-24 |
| 11101184 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma +1 more | 2021-08-24 |
| 11092900 | Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method | Maurits Van Der Schaar, Youping Zhang, Hendrik Jan Hidde Smilde, Anagnostis Tsiatmas, Adriaan Johan Van Leest +3 more | 2021-08-17 |
| 10871367 | Substrate, metrology apparatus and associated methods for a lithographic process | Alok Verma, Hugo Augustinus Joseph Cramer, Anagnostis Tsiatmas, Bert Verstraeten | 2020-12-22 |
| 10845713 | Metrology method and apparatus, computer program and lithographic system | Hugo Augustinus Joseph Cramer | 2020-11-24 |
| 10816904 | Method for determining contribution to a fingerprint | Davit Harutyunyan, Fei Jia, Frank Staals, Fuming Wang, Hugo Thomas Looijestijn +8 more | 2020-10-27 |
| 10811323 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma +5 more | 2020-10-20 |
| 10677589 | Substrate, metrology apparatus and associated methods for a lithographic process | Alok Verma, Hugo Augustinus Joseph Cramer, Anagnostis Tsiatmas, Bert Verstraeten | 2020-06-09 |
| 10615084 | Method and apparatus to determine a patterning process parameter, associated with a change in a physical configuration, using measured pixel optical characteristic values | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma +1 more | 2020-04-07 |
| 10546790 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma +1 more | 2020-01-28 |