Issued Patents All Time
Showing 25 most recent of 43 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12086528 | Secure fingerprinting of a trusted photomask | Gauri Karve, Effendi Leobandung, Gangadhara Raja Muthinti, Ravi K. Bonam | 2024-09-10 |
| 11568101 | Predictive multi-stage modelling for complex process control | Kyong Min Yeo, Robin Hsin Kuo Chao, Derren N. Dunn | 2023-01-31 |
| 11079337 | Secure wafer inspection and identification | Fee Li Lie, Effendi Leobandung, Richard C. Johnson, Robin Hsin Kuo Chao | 2021-08-03 |
| 10642161 | Baseline overlay control with residual noise reduction | Daniel A. Corliss, Richard C. Johnson, Christopher F. Robinson, Chumeng Zheng | 2020-05-05 |
| 10437951 | Care area generation by detection optimized methodology | Ravi K. Bonam, Nelson Felix, Luciana Meli | 2019-10-08 |
| 10210292 | Process-metrology reproducibility bands for lithographic photomasks | Todd C. Bailey, Ioana Graur, Marshal A. Miller | 2019-02-19 |
| 10141188 | Resist having tuned interface hardmask layer for EUV exposure | Michael P. Belyansky, Ravi K. Bonam, Anuja E. DeSilva | 2018-11-27 |
| 10134592 | Resist having tuned interface hardmask layer for EUV exposure | Michael P. Belyansky, Ravi K. Bonam, Anuja E. DeSilva | 2018-11-20 |
| 9928316 | Process-metrology reproducibility bands for lithographic photomasks | Todd C. Bailey, Ioana Graur, Marshal A. Miller | 2018-03-27 |
| 9929012 | Resist having tuned interface hardmask layer for EUV exposure | Michael P. Belyansky, Ravi K. Bonam, Anuja E. DeSilva | 2018-03-27 |
| 9059102 | Metrology marks for unidirectional grating superposition patterning processes | Christopher P. Ausschnitt, Nelson Felix | 2015-06-16 |
| 8875063 | Mask layout formation | Zachary Baum, Henning Haffner | 2014-10-28 |
| 8609322 | Process of making a lithographic structure using antireflective materials | Marie Angelopoulos, Katherina Babich, Sean D. Burns, Allen H. Gabor, Arpan Mahorowala +1 more | 2013-12-17 |
| 8507346 | Method of forming a semiconductor device having a cut-way hole to expose a portion of a hardmask layer | Martin Burkhardt, Matthew E. Colburn, Allen H. Gabor, Oleg Gluschenkov, Howard S. Landis +1 more | 2013-08-13 |
| 8293454 | Process of making a lithographic structure using antireflective materials | Marie Angelopoulos, Katherina Babich, Sean D. Burns, Allen H. Gabor, Arpan Mahorowala +1 more | 2012-10-23 |
| 8158334 | Methods for forming a composite pattern including printed resolution assist features | Allen H. Gabor, Helen Wang | 2012-04-17 |
| 8053172 | Photoresists and methods for optical proximity correction | Wu-Song Huang, Ranee W. Kwong, Pushkara R. Varanasi | 2011-11-08 |
| 8039203 | Integrated circuits and methods of design and manufacture thereof | Helen Wang, Henning Haffner, Haoren Zhuang, Klaus Herold, Matthew E. Colburn +4 more | 2011-10-18 |
| 7993815 | Line ends forming | Matthew E. Colburn, Allen H. Gabor, Donald J. Samuels | 2011-08-09 |
| 7968270 | Process of making a semiconductor device using multiple antireflective materials | Marie Angelopoulos, Katherina Babich, Sean D. Burns, Richard A. Conti, Allen H. Gabor +2 more | 2011-06-28 |
| 7914975 | Multiple exposure lithography method incorporating intermediate layer patterning | Sean D. Burns, Allen H. Gabor, Dirk Pfeiffer | 2011-03-29 |
| 7759235 | Semiconductor device manufacturing methods | Haoren Zhuang, Helen Wang, Len Yuan Tsou | 2010-07-20 |
| 7749903 | Gate patterning scheme with self aligned independent gate etch | Matthew E. Colburn, Bruce B. Doris, Thomas W. Dyer | 2010-07-06 |
| 7485573 | Process of making a semiconductor device using multiple antireflective materials | Marie Angelopoulos, Katherina Babich, Sean D. Burns, Richard A. Conti, Allen H. Gabor +2 more | 2009-02-03 |
| 7268082 | Highly selective nitride etching employing surface mediated uniform reactive layer films | — | 2007-09-11 |