Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12197129 | Substrate treatment method and substrate treatment system | Soichiro Okada, Masashi Enomoto, Hidetami Yaegashi | 2025-01-14 |
| 12047861 | Communication system, communication method, and server | Azusa Murasame | 2024-07-23 |
| 10998183 | Substrate cleaning apparatus, substrate cleaning system, substrate cleaning method and memory medium | Miyako Kaneko, Takehiko Orii, Masami Yamashita, Itaru Kanno | 2021-05-04 |
| 10964606 | Film forming system, film forming method, and computer storage medium | Masashi Enomoto | 2021-03-30 |
| 10101669 | Exposure apparatus, resist pattern forming method, and storage medium | Seiji Nagahara, Gousuke Shiraishi, Kousuke Yoshihara, Shinichiro KAWAKAMI, Masaru Tomono +2 more | 2018-10-16 |
| 10025190 | Substrate treatment system | Seiji Nagahara, Gousuke Shiraishi, Kousuke Yoshihara, Shinichiro KAWAKAMI, Masaru Tomono +2 more | 2018-07-17 |
| 9741559 | Film forming method, computer storage medium, and film forming system | Fumiko Iwao, Kousuke Yoshihara | 2017-08-22 |
| 9341952 | Substrate treatment method, non-transitory computer storage medium and substrate treatment system | Fumiko Iwao | 2016-05-17 |
| 9329483 | Film forming method, non-transitory computer storage medium and film forming apparatus | Fumiko Iwao | 2016-05-03 |
| 9280052 | Substrate treatment method, non-transitory computer storage medium and substrate treatment system | Fumiko Iwao | 2016-03-08 |
| 8791030 | Coating treatment method and coating treatment apparatus | Fumiko Iwao, Kousuke Yoshihara | 2014-07-29 |
| 8283253 | Pattern forming method, semiconductor device manufacturing method and semiconductor device manufacturing apparatus | Hidetami Yaegashi, Takashi Hayakawa | 2012-10-09 |
| 8273661 | Pattern forming method, semiconductor device manufacturing method and semiconductor device manufacturing apparatus | Hidetami Yaegashi | 2012-09-25 |
| 8202682 | Method of manufacturing semiconductor device, and resist coating and developing system | Fumiko Iwao, Tetsu Kawasaki | 2012-06-19 |
| 8075730 | Apparatus for manufacturing a semiconductor device | Kazuhiro Kubota, Ryuichi Asako, Seiichi Takayama | 2011-12-13 |
| 8037890 | Substrate cleaning device and substrate cleaning method | Taro Yamamoto, Hideharu Kyouda, Tetsu Kawasaki | 2011-10-18 |
| 7781342 | Substrate treatment method for etching a base film using a resist pattern | Mitsuaki Iwashita, Keiji Tanouchi | 2010-08-24 |
| 7485568 | Method for forming wiring of semiconductor device | Tetsu Kawasaki | 2009-02-03 |
| 7401988 | Substrate processing apparatus and substrate processing method | Takayuki Katano, Hidefumi Matsui, Junichi Kitano, Yo Suzuki, Masami Yamashita +2 more | 2008-07-22 |
| 7208066 | Substrate processing apparatus and substrate processing method | Junichi Kitano, Yuji Matsuyama, Takahiro Kitano, Takayuki Katano, Hidefumi Matsui +7 more | 2007-04-24 |
| 6485203 | Substrate processing method and substrate processing apparatus | Takayuki Katano, Hidefumi Matsui, Junichi Kitano, Yo Suzuki, Masami Yamashita +2 more | 2002-11-26 |