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Examination of a hole formed in a semiconductor specimen |
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| 11756188 |
Determining a critical dimension variation of a pattern |
Vadim Vereschagin, Ishai Schwarzband, Boaz Cohen, Evgeny Bal, Ariel Shkalim |
2023-09-12 |
| 11686571 |
Local shape deviation in a semiconductor specimen |
Ilan BEN-HARUSH, Rafael BISTRITZER, Vadim Vereschagin, Elad Sommer, Grigory Klebanov +5 more |
2023-06-27 |
| 11651509 |
Method, system and computer program product for 3D-NAND CDSEM metrology |
Roi Meir, Sahar LEVIN, Ishai Schwarzband, Grigory Klebanov, Shimon Levi +6 more |
2023-05-16 |
| 11476081 |
Evaluating an intermediate product related to a three-dimensional NAND memory unit |
Vadim Vereschagin, Assaf Shamir, Elad Sommer, Sharon Duvdevani-Bar, Meng Li Cecilia Lim |
2022-10-18 |
| 11455715 |
Epitaxy metrology in fin field effect transistors |
Jitendra Pradipkumar Chaudhary, Ran Alkoken, Sahar LEVIN, Chih-Chieh Chang, Einat Frishman |
2022-09-27 |
| 11443420 |
Generating a metrology recipe usable for examination of a semiconductor specimen |
Grigory Klebanov, Einat Frishman, Tal Orenstein, Meir Vengrover, Noa Marom +3 more |
2022-09-13 |
| 11301983 |
Measuring height difference in patterns on semiconductor wafers |
Ishai Schwarzband, Yan Avniel, Sergey Khristo, Mor Baram, Shimon Levi +1 more |
2022-04-12 |
| 11276160 |
Determining a critical dimension variation of a pattern |
Vadim Vereschagin, Ishai Schwarzband, Boaz Cohen, Ariel Shkalim, Evgeny Bal |
2022-03-15 |
| 11056404 |
Evaluating a hole formed in an intermediate product |
Grigory Klebanov, Dhananjay Singh Rathore, Einat Frishman, Sharon Duvdevani-Bar, Assaf Shamir +5 more |
2021-07-06 |
| 10748272 |
Measuring height difference in patterns on semiconductor wafers |
Ishai Schwarzband, Yan Avniel, Sergey Khristo, Mor Baram, Shimon Levi +1 more |
2020-08-18 |
| 10731979 |
Method for monitoring nanometric structures |
Shimon Levi, Ishai Schwarzband |
2020-08-04 |
| 10354376 |
Technique for measuring overlay between layers of a multilayer structure |
Yakov Weinberg, Ishai Schwarzband, Itay Zauer, Ran Goldman, Olga Novak +3 more |
2019-07-16 |
| 9916652 |
Technique for measuring overlay between layers of a multilayer structure |
Yakov Weinberg, Ishai Schwarzband, Itay Zauer, Ran Goldman, Olga Novak +3 more |
2018-03-13 |
| 9824852 |
CD-SEM technique for wafers fabrication control |
Yakov Weinberg, Yan Ivanchenko, Ishai Schwarzband, Dan Lange, Arbel Englander +3 more |
2017-11-21 |
| 9530199 |
Technique for measuring overlay between layers of a multilayer structure |
Yakov Weinberg, Ishai Schwarzband, Itay Zauer, Ran Goldman, Olga Novak +3 more |
2016-12-27 |
| 9165376 |
System, method and computer readable medium for detecting edges of a pattern |
Ishai Schwartzband, Shimon Levi |
2015-10-20 |
| 7973919 |
High resolution wafer inspection system |
Dan Grossman, Moshe Langer, Silviu Reinhorn, Ron Naftali, Haim Feldman |
2011-07-05 |
| 7714999 |
High resolution wafer inspection system |
Dan Grossman, Moshe Langer, Silviu Reinhorn, Ron Naftali, Haim Feldman |
2010-05-11 |
