| 9443753 |
Apparatus for controlling the flow of a gas in a process chamber |
David Palagashvili, Michael D. Willwerth |
2016-09-13 |
| 8936696 |
Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor |
Roger Alan Lindley, Bryan Pu, Keiji Horioka |
2015-01-20 |
| 8840725 |
Chamber with uniform flow and plasma distribution |
David Palagashvili, Michael D. Willwerth, ALEX ERENSTEIN |
2014-09-23 |
| 8580693 |
Temperature enhanced electrostatic chucking in plasma processing apparatus |
Sergey G. Belostotskiy, Michael G. Chafin, David Palagashvili |
2013-11-12 |
| 8187415 |
Plasma etch reactor with distribution of etch gases across a wafer surface and a polymer oxidizing gas in an independently fed center gas zone |
Jong Mun Kim, Bryan Pu |
2012-05-29 |
| 7879186 |
Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor |
Roger Alan Lindley, Bryan Pu, Keiji Horioka |
2011-02-01 |
| 7838430 |
Plasma control using dual cathode frequency mixing |
Steven C. Shannon, Dennis S. Grimard, Theodoros Panagopoulos, Daniel J. Hoffman, Michael G. Chafin +4 more |
2010-11-23 |
| 7807064 |
Halogen-free amorphous carbon mask etch having high selectivity to photoresist |
Jong Mun Kim, Judy Wang, Ajey M. Joshi, Bryan Pu |
2010-10-05 |
| 7736914 |
Plasma control using dual cathode frequency mixing and controlling the level of polymer formation |
Taeho Shin, Bryan Pu |
2010-06-15 |
| 7422654 |
Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor |
Roger Alan Lindley, Bryan Pu, Keiji Horioka |
2008-09-09 |
| 7316761 |
Apparatus for uniformly etching a dielectric layer |
Kenny L. Doan, Yunsang Kim, Mahmoud Dahimene, Bryan Pu, Hongqing Shan +1 more |
2008-01-08 |
| 7105442 |
Ashable layers for reducing critical dimensions of integrated circuit features |
Hongching Shan, Kenny L. Doan, Michael Barnes, Hong Dang Nguyen, Christopher Dennis Bencher +4 more |
2006-09-12 |
| 6787475 |
Flash step preparatory to dielectric etch |
Zhuxu Wang, Claes Bjorkman, Bryan Pu |
2004-09-07 |
| 6613689 |
Magnetically enhanced plasma oxide etch using hexafluorobutadiene |
Takehiko Komatsu, Hongqing Shan, Keji Horioka, Bryan Pu |
2003-09-02 |
| 6451703 |
Magnetically enhanced plasma etch process using a heavy fluorocarbon etching gas |
Takehiko Komatsu, Hongqing Shan, Keji Horioka, Bryan Pu |
2002-09-17 |
| 6403491 |
Etch method using a dielectric etch chamber with expanded process window |
Judy Wang, Takehiko Komatsu, Bryan Pu, Kenny L. Doan, Claes Bjorkman +4 more |
2002-06-11 |
