Issued Patents All Time
Showing 1–25 of 63 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10649349 | Lithographic apparatus, a dryer and a method of removing liquid from a surface | Martinus Hendrikus Antonius Leenders, Sjoerd Nicolaas Lambertus Donders, Louis John Markoya, Marcus Martinus Petrus Adrianus Vermeulen, Diane Elaine Markoya | 2020-05-12 |
| 10185231 | Lithographic apparatus, a dryer and a method of removing liquid from a surface | Martinus Hendrikus Antonius Leenders, Sjoerd Nicolaas Lambertus Donders, Louis John Markoya, Marcus Martinus Petrus Adrianus Vermeulen, Diane Elaine Markoya | 2019-01-22 |
| 9632425 | Lithographic apparatus, a dryer and a method of removing liquid from a surface | Martinus Hendrikus Antonius Leenders, Sjoerd Nicolaas Lambertus Donders, Louis John Markoya, Marcus Martinus Petrus Adrianus Vermeulen, Diane McCafferty | 2017-04-25 |
| 9330912 | Lithographic apparatus, fluid combining unit and device manufacturing method | Johannes Catharinus Hubertus Mulkens, Matthew Lipson, Louis John Markoya | 2016-05-03 |
| 9046754 | EUV mask inspection system | Eric Brian Catey, Adel Joobeur, Yevgeniy Konstantinovich Shmarev | 2015-06-02 |
| 9041903 | Mask inspection with fourier filtering and image compare | Michael L. Nelson, Eric Brian Catey | 2015-05-26 |
| 8980724 | Alignment target contrast in a lithographic double patterning process | Mircea Dusa, Richard Johannes Franciscus Van Haren, Manfred Gawein Tenner, Maya Angelova Doytcheva | 2015-03-17 |
| 8817226 | Systems and methods for insitu lens cleaning using ozone in immersion lithography | Louis John Markoya | 2014-08-26 |
| 8736807 | Systems and methods for thermally-induced aberration correction in immersion lithography | Louis John Markoya, Diane McCafferty | 2014-05-27 |
| 8730476 | Tunable wavelength illumination system | Arie Jeffrey Den Boef, Earl William Ebert, Keith Andersen, Sanjeev Singh | 2014-05-20 |
| 8709908 | Improving alignment target contrast in a lithographic double patterning process | Mircea Dusa, Richard Johannes Franciscus Van Haren, Manfred Gawein Tenner, Maya Angelova Doytcheva | 2014-04-29 |
| 8654311 | Lithographic apparatus and device manufacturing method | Jozef Petrus Henricus Benschop | 2014-02-18 |
| 8654305 | Systems and methods for insitu lens cleaning in immersion lithography | Louis John Markoya | 2014-02-18 |
| 8629970 | Immersion lithographic apparatus with immersion fluid re-circulating system | Erik Roelof Loopstra, Johannes Catharinus Hubertus Mulkens, Louis John Markoya, Diane McCafferty | 2014-01-14 |
| 8623588 | Scanning EUV interference imaging for extremely high resolution patterning | — | 2014-01-07 |
| 8625096 | Method and system for increasing alignment target contrast | Mircea Dusa, Richard Johannes Franciscus Van Haren, Manfred Gawein Tenner, Maya Angelova Doytcheva | 2014-01-07 |
| 8508736 | Tunable wavelength illumination system | Arie Jeffrey Den Boef, Keith William ANDRESEN, Earl William Ebert, Sanjeev Singh | 2013-08-13 |
| 8456611 | System and method to increase surface tension and contact angle in immersion lithography | — | 2013-06-04 |
| 8451422 | Re-flow and buffer system for immersion lithography | Erik Theodorus Maria Bijlaart, Sjoerd Nicolaas Lambertus Donders, Louis John Markoya, Diane McCafferty, Ralph Joseph Meijers | 2013-05-28 |
| 8339571 | Lithographic method and apparatus | Jozef Petrus Henricus Benschop | 2012-12-25 |
| 8329366 | Apparatus and method for providing resist alignment marks in a double patterning lithographic process | Maya Angelova Doytcheva, Mircea Dusa, Richard Johannes Franciscus Van Haren, Robertus Wilhelmus Van Der Heijden | 2012-12-11 |
| 8203693 | Liquid immersion lithography system comprising a tilted showerhead relative to a substrate | Aleksandr Khmelichek, Louis John Markoya, Erik Roelof Loopstra, Nicolaas Ten Kate | 2012-06-19 |
| 8089609 | Lithographic apparatus and device manufacturing method | Justin Kreuzer | 2012-01-03 |
| 8054449 | Enhancing the image contrast of a high resolution exposure tool | — | 2011-11-08 |
| 8045135 | Lithographic apparatus with a fluid combining unit and related device manufacturing method | Johannes Catharinus Hubertus Mulkens, Matthew Lipson, Louis John Markoya | 2011-10-25 |