FG

Florian Gstrein

IN Intel: 66 patents #422 of 30,777Top 2%
JG Julius Blum Gmbh: 3 patents #54 of 148Top 40%
📍 Portland, OR: #223 of 9,213 inventorsTop 3%
🗺 Oregon: #424 of 28,073 inventorsTop 2%
Overall (All Time): #29,760 of 4,157,543Top 1%
69
Patents All Time

Issued Patents All Time

Showing 51–69 of 69 patents

Patent #TitleCo-InventorsDate
10109583 Method for creating alternate hardmask cap interconnect structure with increased overlay margin Robert L. Bristol, Manish Chandhok, Jasmeet S. Chawla, Eungnak Han, Rami Hourani +3 more 2018-10-23
9932671 Precursor and process design for photo-assisted metal atomic layer deposition (ALD) and chemical vapor deposition (CVD) James M. Blackwell, Patricio E. Romero, Scott B. Clendenning, Grant Kloster, Harsono S. Simka +2 more 2018-04-03
9899255 Via blocking layer Rami Hourani, Marie Krysak, Ruth A. Brain, Mark Bohr 2018-02-20
9793163 Subtractive self-aligned via and plug patterning for back end of line (BEOL) interconnects Robert L. Bristol, Richard E. Schenker, Paul A. Nyhus, Charles H. Wallace, Hui Jae Yoo 2017-10-17
9754778 Metallization of fluorocarbon-based dielectric for interconnects David J. Michalak 2017-09-05
9659869 Forming barrier walls, capping, or alloys /compounds within metal lines Christopher J. Jezewski, Alan M Meyers, Kanwal Jit Singh, Tejaswi K. Indukuri, James S. Clarke 2017-05-23
9583389 Selective area deposition of metal films by atomic layer deposition (ALD) and chemical vapor deposition (CVD) Patricio E. Romero, Scott B. Clendenning, Jeanette M. Roberts 2017-02-28
9530733 Forming layers of materials over small regions by selective chemical reaction including limiting enchroachment of the layers over adjacent regions Robert L. Bristol, James M. Blackwell, Scott B. Clendenning, Eungnak Han, Grant Kloster +3 more 2016-12-27
9514983 Cobalt based interconnects and methods of fabrication thereof Christopher J. Jezewski, James S. Clarke, Tejaswi K. Indukuri, Daniel J. Zierath 2016-12-06
9324652 Method of creating a maskless air gap in back end interconnections with double self-aligned vias Manish Chandhok, Hui Jae Yoo, Yan Borodovsky, David Shykind, Kevin Lin 2016-04-26
9236292 Selective area deposition of metal films by atomic layer deposition (ALD) and chemical vapor deposition (CVD) Patricio E. Romero, Scott B. Clendenning, Jeanette M. Roberts 2016-01-12
9111939 Metallization of fluorocarbon-based dielectric for interconnects David J. Michalak 2015-08-18
9085461 Method and apparatus to fabricate polymer arrays on patterned wafers using electrochemical synthesis Valery M. Dubin, Gordon Holt, Brandon Barnett 2015-07-21
8975138 Method of creating a maskless air gap in back end interconnects with double self-aligned vias Manish Chandhok, Hui Jae Yoo, Yan Borodovsky, David Shykind, Kevin Lin 2015-03-10
8278121 Method and apparatus to fabricate polymer arrays on patterned wafers using electrochemical synthesis Valery M. Dubin, Gordon Holt, Brandon Barnett 2012-10-02
8053774 Method and apparatus to fabricate polymer arrays on patterned wafers using electrochemical synthesis Valery M. Dubin, Gordon Holt, Brandon Barnett 2011-11-08
7635503 Composite metal films and carbon nanotube fabrication Juan E. Dominguez, Valery M. Dubin, Michael Goldstein 2009-12-22
7625817 Method of fabricating a carbon nanotube interconnect structures Valery M. Dubin, Juan E. Dominguez, Adrien LaVoie 2009-12-01
7208327 Metal oxide sensors and method of forming Valery M. Dubin 2007-04-24