Issued Patents All Time
Showing 51–75 of 94 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9224826 | Multiple thickness gate dielectrics for replacement gate field effect transistors | Wing L. Lai, Vijay Narayanan, Sean M. Polvino, Ravikumar Ramachandran, Shahab Siddiqui | 2015-12-29 |
| 9177868 | Annealing oxide gate dielectric layers for replacement metal gate field effect transistors | Wing L. Lai, Vijay Narayanan, Ravikumar Ramachandran, Shahab Siddiqui | 2015-11-03 |
| 9171844 | Gate structures and methods of manufacture | Ramachandran Muralidhar, Viorel Ontalus | 2015-10-27 |
| 9105745 | Fabrication of low threshold voltage and inversion oxide thickness scaling for a high-k metal gate p-type MOSFET | Takashi Ando, Changhwan Choi, Martin M. Frank, Vijay Narayanan | 2015-08-11 |
| 9099394 | Non-volatile memory structure employing high-k gate dielectric and metal gate | Nicolas L. Breil, Michael P. Chudzik, Rishikesh Krishnan, Siddarth A. Krishnan | 2015-08-04 |
| 9087784 | Structure and method of Tinv scaling for high k metal gate technology | Michael P. Chudzik, Dechao Guo, Siddarth A. Krishnan, Carl Radens, Shahab Siddiqui | 2015-07-21 |
| 9087722 | Semiconductor devices having different gate oxide thicknesses | Charlotte DeWan Adams, Michael P. Chudzik, Siddarth A. Krishnan, Shahab Siddiqui | 2015-07-21 |
| 9082877 | Complementary metal oxide semiconductor (CMOS) device having gate structures connected by a metal gate conductor | Yue Liang, Dureseti Chidambarrao, Brian J. Greene, William K. Henson, Shreesh Narasimha +1 more | 2015-07-14 |
| 9059313 | Replacement gate having work function at valence band edge | Keith Kwong Hon Wong, Michael P. Chudzik | 2015-06-16 |
| 9006837 | Structure and method of Tinv scaling for high k metal gate technology | Michael P. Chudzik, Dechao Guo, Siddarth A. Krishnan, Carl Radens, Shahab Siddiqui | 2015-04-14 |
| 8940599 | Scaled equivalent oxide thickness for field effect transistor devices | Takashi Ando, Changhwan Choi, Vijay Narayanan | 2015-01-27 |
| 8941177 | Semiconductor devices having different gate oxide thicknesses | Charlotte DeWan Adams, Michael P. Chudzik, Siddarth A. Krishnan, Shahab Siddiqui | 2015-01-27 |
| 8912607 | Replacement metal gate structures providing independent control on work function and gate leakage current | Ramachandra Divakaruni, Siddarth A. Krishnan, Ravikumar Ramachandran | 2014-12-16 |
| 8901674 | Scaling of metal gate with aluminum containing metal layer for threshold voltage shift | Keith Kwong Hon Wong, Dechao Guo, Christopher C. Parks, Yun-Yu Wang | 2014-12-02 |
| 8895384 | Gate structures and methods of manufacture | Ramachandran Muralidhar, Viorel Ontalus | 2014-11-25 |
| 8809176 | Replacement gate with reduced gate leakage current | Takashi Ando, Michael P. Chudzik, Rishikesh Krishnan, Siddarth A. Krishnan, Keith Kwong Hon Wong | 2014-08-19 |
| 8803243 | Complementary metal oxide semiconductor (CMOS) device having gate structures connected by a metal gate conductor | Yue Liang, Dureseti Chidambarrao, Brian J. Greene, William K. Henson, Shreesh Narasimha +1 more | 2014-08-12 |
| 8759172 | Etch stop layer formation in metal gate process | Zhengwen Li, Michael P. Chudzik, Ramachandra Divakaruni, Siddarth A. Krishnan, Richard S. Wise | 2014-06-24 |
| 8735996 | Scavenging metal stack for a high-K gate dielectric | Takashi Ando, Vijay Narayanan, James K. Schaeffer | 2014-05-27 |
| 8728925 | Method and structure for work function engineering in transistors including a high dielectric constant gate insulator and metal gate (HKMG) | Michael P. Chudzik, William K. Henson | 2014-05-20 |
| 8716088 | Scavenging metal stack for a high-K gate dielectric | Takashi Ando, Vijay Narayanan, James K. Schaeffer | 2014-05-06 |
| 8716118 | Replacement gate structure for transistor with a high-K gate stack | Takashi Ando, Eduard A. Cartier, Vijay Narayanan | 2014-05-06 |
| 8716813 | Scaled equivalent oxide thickness for field effect transistor devices | Takashi Ando, Changhwan Choi, Vijay Narayanan | 2014-05-06 |
| 8659077 | Multi-layer work function metal replacement gate | Takashi Ando, Aritra Dasgupta, Sean M. Polvino | 2014-02-25 |
| 8647972 | Multi-layer work function metal replacement gate | Takashi Ando, Aritra Dasgupta, Sean M. Polvino | 2014-02-11 |