Issued Patents All Time
Showing 76–94 of 94 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8643115 | Structure and method of Tinv scaling for high κ metal gate technology | Michael P. Chudzik, Dechao Guo, Siddarth A. Krishnan, Carl Radens, Shahab Siddiqui | 2014-02-04 |
| 8629014 | Replacement metal gate structures for effective work function control | Michael P. Chudzik, Ravikumar Ramachandran | 2014-01-14 |
| 8581351 | Replacement gate with reduced gate leakage current | Takashi Ando, Michael P. Chudzik, Rishikesh Krishnan, Siddarth A. Krishnan, Keith Kwong Hon Wong | 2013-11-12 |
| 8575709 | High-k dielectric gate structures resistant to oxide growth at the dielectric/silicon substrate interface and methods of manufacture thereof | Huiming Bu, Michael P. Chudzik, Wei He, William K. Henson, Siddarth A. Krishnan +2 more | 2013-11-05 |
| 8557649 | Method for controlling structure height | Rajasekhar Venigalla, Michael V. Aquilino, Massud Aminpur, Michael P. Belyansky, Christopher D. Sheraw +1 more | 2013-10-15 |
| 8552502 | Structure and method to make replacement metal gate and contact metal | Zhengwen Li, Michael P. Chudzik, Filippos Papadatos, Andrew H. Simon, Keith Kwong Hon Wong | 2013-10-08 |
| 8546211 | Replacement gate having work function at valence band edge | Keith Kwong Hon Wong, Michael P. Chudzik | 2013-10-01 |
| 8450169 | Replacement metal gate structures providing independent control on work function and gate leakage current | Ramachandra Divakaruni, Siddarth A. Krishnan, Ravikumar Ramachandran | 2013-05-28 |
| 8420491 | Structure and method for replacement metal gate field effect transistors | Henry K. Utomo, Dimitri Anastassios Levedakis, Ravikumar Ramachandran, Viraj Y. Sardesai, Rajasekhar Venigalla | 2013-04-16 |
| 8420473 | Replacement gate devices with barrier metal for simultaneous processing | Takashi Ando, Michael P. Chudzik, Siddarth A. Krishnan, Vijay Narayanan | 2013-04-16 |
| 8354313 | Method to optimize work function in complementary metal oxide semiconductor (CMOS) structures | Dechao Guo, Siddarth A. Krishnan, Ramachandran Muralidhar | 2013-01-15 |
| 8350341 | Method and structure for work function engineering in transistors including a high dielectric constant gate insulator and metal gate (HKMG) | Michael P. Chudzik, William K. Henson | 2013-01-08 |
| 8343839 | Scaled equivalent oxide thickness for field effect transistor devices | Takashi Ando, Changhwan Choi, Vijay Narayanan | 2013-01-01 |
| 8318565 | High-k dielectric gate structures resistant to oxide growth at the dielectric/silicon substrate interface and methods of manufacture thereof | Huiming Bu, Michael P. Chudzik, Wei He, William K. Henson, Siddarth A. Krishnan +2 more | 2012-11-27 |
| 8283217 | Prevention of oxygen absorption into high-K gate dielectric of silicon-on-insulator based finFET devices | Dechao Guo, Chun-Chen Yeh, Zhen Zhang | 2012-10-09 |
| 8241981 | Method of fabricating a deep trench (DT) metal-insulator-metal (MIM) capacitor | Rishikesh Krishnan, Joseph F. Shepard, Jr., Michael P. Chudzik, Christian Lavoie, Dong-Ick Lee +2 more | 2012-08-14 |
| 8232148 | Structure and method to make replacement metal gate and contact metal | Zhengwen Li, Michael P. Chudzik, Filippos Papadatos, Andrew H. Simon, Keith Kwong Hon Wong | 2012-07-31 |
| 7838908 | Semiconductor device having dual metal gates and method of manufacture | Siddarth A. Krishnan, Takashi Ando, Michael P. Chudzik, Martin M. Frank, William K. Henson +5 more | 2010-11-23 |
| 7691701 | Method of forming gate stack and structure thereof | Michael P. Belyansky, Siddarth A. Krishnan, Naim Moumen, Ravikumar Ramachandran, James K. Schaeffer +3 more | 2010-04-06 |