Issued Patents All Time
Showing 51–75 of 101 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8551313 | Method and apparatus for electroplating on soi and bulk semiconductor wafers | Veeraraghavan S. Basker, Hariklia Deligianni, Rajarao Jammy, Vamsi K. Paruchuri | 2013-10-08 |
| 8492247 | Programmable FETs using Vt-shift effect and methods of manufacture | Qingqing Liang, Yue Liang, Yanfeng Wang | 2013-07-23 |
| 8304306 | Fabrication of devices having different interfacial oxide thickness via lateral oxidation | Jin Cai, Martin M. Frank, Marwan H. Khater | 2012-11-06 |
| 8242560 | FinFET with thin gate dielectric layer | Kangguo Cheng, Bruce B. Doris, Ying Zhang | 2012-08-14 |
| 8193051 | Selective implementation of barrier layers to achieve threshold voltage control in CMOS device fabrication with high-k dielectrics | Nestor A. Bojarczuk, Cyril Cabral, Jr., Matthew W. Copel, Martin M. Frank, Evgeni Gousev +4 more | 2012-06-05 |
| 8187961 | Threshold adjustment for high-K gate dielectric CMOS | Bruce B. Doris, Vijay Narayanan, Vamsi K. Paruchuri | 2012-05-29 |
| 8153514 | Method of forming metal/high-κ gate stacks with high mobility | Wanda Andreoni, Alessandro C. Callegari, Alessandro Curioni, Christopher P. D'Emic, Evgeni Gousev +9 more | 2012-04-10 |
| 8097500 | Method and apparatus for fabricating a high-performance band-edge complementary metal-oxide-semiconductor device | Takashi Ando, Changhwan Choi, Elizabeth A. Duch, Bruce B. Doris, Young-Hee Kim +3 more | 2012-01-17 |
| 8035173 | CMOS transistors with differential oxygen content high-K dielectrics | Huiming Bu, Bruce B. Doris, Young-Hee Kim, Barry P. Linder, Vijay Narayanan +2 more | 2011-10-11 |
| 7999323 | Using metal/metal nitride bilayers as gate electrodes in self-aligned aggressively scaled CMOS devices | Matthew W. Copel, Bruce B. Doris, Rajarao Jammy, Young-Hee Kim, Barry P. Linder +3 more | 2011-08-16 |
| 7928514 | Selective implementation of barrier layers to achieve threshold voltage control in CMOS device fabrication with high-k dielectrics | Nestor A. Bojarczuk, Cyril Cabral, Jr., Matthew W. Copel, Martin M. Frank, Evgeni Gousev +4 more | 2011-04-19 |
| 7919379 | Dielectric spacer removal | Rashmi Jha, Sivananda K. Kanakasabapathy, Xi Li, Renee T. Mo, Vijay Narayanan +6 more | 2011-04-05 |
| 7887711 | Method for etching chemically inert metal oxides | Douglas A. Buchanan, Evgeni Gousev, Harald Okorn-Schmidt, Katherine L. Saenger | 2011-02-15 |
| 7880243 | Simple low power circuit structure with metal gate and high-k dielectric | Bruce B. Doris, Barry P. Linder, Vijay Narayanan, Vamsi K. Paruchuri | 2011-02-01 |
| 7871869 | Extremely-thin silicon-on-insulator transistor with raised source/drain | Steven J. Koester, Kingsuk Maitra, Amlan Majumdar, Renee T. Mo | 2011-01-18 |
| 7858500 | Low threshold voltage semiconductor device with dual threshold voltage control means | Matthew W. Copel, Martin M. Frank, Evgeni Gousev, Paul C. Jamison, Rajarao Jammy +2 more | 2010-12-28 |
| 7807525 | Low power circuit structure with metal gate and high-k dielectric | Bruce B. Doris, Barry P. Linder, Vijay Narayanan, Vamsi K. Paruchuri | 2010-10-05 |
| 7745278 | Selective implementation of barrier layers to achieve threshold voltage control in CMOS device fabrication with high K dielectrics | Nestor A. Bojarczuk, Cyril Cabral, Jr., Matthew W. Copel, Martin M. Frank, Evgeni Gousev +4 more | 2010-06-29 |
| 7741188 | Deep trench (DT) metal-insulator-metal (MIM) capacitor | Thomas W. Dyer, Michael P. Chudzik, Naim Moumen | 2010-06-22 |
| 7723798 | Low power circuit structure with metal gate and high-k dielectric | Bruce B. Doris, Barry P. Linder, Vijay Narayanan, Vamsi K. Paruchuri | 2010-05-25 |
| 7696036 | CMOS transistors with differential oxygen content high-k dielectrics | Huiming Bu, Bruce B. Doris, Young-Hee Kim, Barry P. Linder, Vijay Narayanan +2 more | 2010-04-13 |
| 7655994 | Low threshold voltage semiconductor device with dual threshold voltage control means | Mathew W. Copel, Martin M. Frank, Evgeni Gousev, Paul C. Jamison, Rajarao Jammy +2 more | 2010-02-02 |
| 7652332 | Extremely-thin silicon-on-insulator transistor with raised source/drain | Steven J. Koester, Kingsuk Maitra, Amlan Majumdar, Renee T. Mo | 2010-01-26 |
| 7598545 | Using metal/metal nitride bilayers as gate electrodes in self-aligned aggressively scaled CMOS devices | Matthew W. Copel, Bruce B. Doris, Rajarao Jammy, Young-Hee Kim, Barry P. Linder +3 more | 2009-10-06 |
| 7560361 | Method of forming gate stack for semiconductor electronic device | Martin M. Frank, Alexander Reznicek, Evgeni Gousev | 2009-07-14 |