Issued Patents All Time
Showing 26–50 of 79 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7138606 | Wafer processing method | Seiichiro Kanno, Ryoji Nishio, Saburou Kanai, Hideki Kihara, Koji Okuda | 2006-11-21 |
| 7049243 | Surface processing method of a specimen and surface processing apparatus of the specimen | Tetsuo Ono, Yasuhiro Nishimori, Takashi Sato, Naoyuki Kofuji, Masaru Izawa +7 more | 2006-05-23 |
| 6962472 | Vacuum processing apparatus and semiconductor manufacturing line using the same | Minoru Soraoka, Yoshinao Kawasaki | 2005-11-08 |
| 6895685 | Vacuum processing apparatus and semiconductor manufacturing line using the same | Minoru Soraoka, Yoshinao Kawasaki | 2005-05-24 |
| 6895179 | Wafer stage for wafer processing apparatus | Seiichiro Kanno, Ryoji Nishio, Saburou Kanai, Hideki Kihara, Koji Okuda | 2005-05-17 |
| 6867144 | Apparatus and method for plasma processing high-speed semiconductor circuits with increased yield | Yutaka Ohmoto, Hironobu Kawahara, Kazue Takahashi, Saburou Kanai | 2005-03-15 |
| 6850012 | Plasma processing apparatus | Manabu Edamura, Kazuyuki Ikenaga, Akitaka Makino | 2005-02-01 |
| 6846363 | Plasma processing apparatus and method | Hideyuki Kazumi, Tsutomu Tetsuka, Ryoji Nishio, Masatsugu Arai, Tsunehiko Tsubone +4 more | 2005-01-25 |
| 6837005 | Weatherstrip for automobile | Mithuaki Arata, Hitoshi Hamanaka, Kazuhiko Tokutomi | 2005-01-04 |
| 6835665 | Etching method of hardly-etched material and semiconductor fabricating method and apparatus using the method | Nobuyuki Mise, Ryoji Nishio, Tatehito Usui | 2004-12-28 |
| 6833051 | Plasma processing apparatus and method | Hideyuki Kazumi, Tsutomu Tetsuka, Ryoji Nishio, Masatsugu Arai, Tsunehiko Tsubone +4 more | 2004-12-21 |
| 6825617 | Semiconductor processing apparatus | Seiichiro Kanno, Ryoji Nishio, Saburou Kanai, Hideki Kihara, Hideyuki Yamamoto | 2004-11-30 |
| 6759338 | Plasma processing apparatus and method | Yutaka Ohmoto, Hironobu Kawahara, Kazue Takahashi, Saburou Kanai | 2004-07-06 |
| 6756737 | Plasma processing apparatus and method | Akira Doi, Manabu Edamura, Hideyuki Kazumi, Saburou Kanai, Tsutomu Tetsuka +3 more | 2004-06-29 |
| 6752580 | Vacuum processing apparatus and semiconductor manufacturing line using the same | Minoru Soraoka, Yoshinao Kawasaki | 2004-06-22 |
| 6752579 | Vacuum processing apparatus and semiconductor manufacturing line using the same | Minoru Soraoka, Yoshinao Kawasaki | 2004-06-22 |
| 6705828 | Vacuum processing apparatus and semiconductor manufacturing line using the same | Minoru Soraoka, Yoshinao Kawasaki | 2004-03-16 |
| 6677244 | Specimen surface processing method | Tetsuo Ono, Yasuhiro Nishimori, Takashi Sato, Naoyuki Kofuji, Masaru Izawa +7 more | 2004-01-13 |
| 6672819 | Vacuum processing apparatus and semiconductor manufacturing line using the same | Minoru Soraoka, Yoshinao Kawasaki | 2004-01-06 |
| 6649021 | Apparatus and method for plasma processing high-speed semiconductor circuits with increased yield | Yutaka Ohmoto, Hironobu Kawahara, Kazue Takahashi, Saburou Kanai | 2003-11-18 |
| 6646233 | Wafer stage for wafer processing apparatus and wafer processing method | Seiichiro Kanno, Ryoji Nishio, Saburou Kanai, Hideki Kihara, Koji Okuda | 2003-11-11 |
| 6596551 | Etching end point judging method, etching end point judging device, and insulating film etching method using these methods | Tatehito Usui, Shoji Ikuhara, Kouji Nishihata, Kazue Takahashi, Tetsunori Kaji +1 more | 2003-07-22 |
| 6549393 | Semiconductor wafer processing apparatus and method | Seiichiro Kanno, Hironobu Kawahara, Mitsuru Suehiro, Saburo Kanai | 2003-04-15 |
| 6526330 | Vacuum processing apparatus and semiconductor manufacturing line using the same | Minoru Soraoka, Yoshinao Kawasaki | 2003-02-25 |
| 6519504 | Vacuum processing apparatus and semiconductor manufacturing line using the same | Minoru Soraoka, Yoshinao Kawasaki | 2003-02-11 |