DH

David V. Horak

Globalfoundries: 20 patents #152 of 4,424Top 4%
GP Globalfoundries Singapore Pte.: 5 patents #141 of 828Top 20%
FS Freeescale Semiconductor: 2 patents #1,335 of 3,767Top 40%
Samsung: 1 patents #49,284 of 75,807Top 70%
GU Globalfoundries U.S.: 1 patents #22 of 211Top 15%
📍 South Burlington, VT: #1 of 1,136 inventorsTop 1%
🗺 Vermont: #5 of 4,968 inventorsTop 1%
Overall (All Time): #800 of 4,157,543Top 1%
365
Patents All Time

Issued Patents All Time

Showing 301–325 of 365 patents

Patent #TitleCo-InventorsDate
6426558 Metallurgy for semiconductor devices Jonathan D. Chapple-Sokol, Paul M. Feeney, Robert M. Geffken, Mark P. Murray, Anthony K. Stamper 2002-07-30
6426175 Fabrication of a high density long channel DRAM gate with or without a grooved gate Toshiharu Furukawa, Mark C. Hakey, Stevn J. Holmes, Paul A. Rabidoux 2002-07-30
6420748 Borderless bitline and wordline DRAM structure Mark C. Hakey, William H. Ma, Wendell P. Noble 2002-07-16
6391426 High capacitance storage node structures Mark C. Hakey, Steven J. Holmes, William H. Ma 2002-05-21
6387783 Methods of T-gate fabrication using a hybrid resist Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, Paul A. Rabidoux 2002-05-14
6376873 Vertical DRAM cell with robust gate-to-storage node isolation Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, Thomas S. Kanarsky, Jeffrey J. Welser 2002-04-23
6373091 Vertical DRAM cell with TFT over trench capacitor Rick L. Mohler, Gorden Seth Starkey, Jr. 2002-04-16
6372412 Method of producing an integrated circuit chip using frequency doubling hybrid photoresist and apparatus formed thereby Mark C. Hakey, Steven J. Holmes, Ahmad D. Katnani, Niranjan M. Patel, Paul A. Rabidoux 2002-04-16
6358813 Method for increasing the capacitance of a semiconductor capacitors Steven J. Holmes, Charles T. Black, David J. Frank, Toshiharu Furukawa, Mark C. Hakey +3 more 2002-03-19
6344416 Deliberate semiconductor film variation to compensate for radial processing differences, determine optimal device characteristics, or produce small productions Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes 2002-02-05
6342722 Integrated circuit having air gaps between dielectric and conducting lines Michael D. Armacost, Peter D. Hoh, Richard S. Wise 2002-01-29
6333533 Trench storage DRAM cell with vertical three-sided transfer device Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, Thomas S. Kanarsky, Jack A. Mandelman 2001-12-25
6333229 Method for manufacturing a field effect transitor (FET) having mis-aligned-gate structure Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes 2001-12-25
6333245 Method for introducing dopants into semiconductor devices using a germanium oxide sacrificial layer Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, William H. Ma, Donald W. Rakowski 2001-12-25
6326275 DRAM cell with vertical CMOS transistor Jay G. Harrington, Kevin M. Houlihan, Chung H. Lam, Rebecca D. Mih 2001-12-04
6323082 Process for making a DRAM cell with three-sided gate transfer Toshiharu Furukawa, Steven J. Holmes, Mark C. Hakey, Jack A. Mandelman 2001-11-27
6319759 Method for making oxide Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, William H. Ma 2001-11-20
6313492 Integrated circuit chip produced by using frequency doubling hybrid photoresist Mark C. Hakey, Steven J. Holmes, Ahmad D. Katnani, Niranjan M. Patel, Paul A. Rabidoux 2001-11-06
6303272 Process for self-alignment of sub-critical contacts to wiring Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, Paul A. Rabidoux 2001-10-16
6297166 Method for modifying nested to isolated offsets Bernie F. Duncan 2001-10-02
6282115 Multi-level DRAM trench store utilizing two capacitors and two plates Toshiharu Furukawa, Howard L. Kalter 2001-08-28
6277543 Method for forming features using frequency doubling hybrid resist and device formed thereby Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, Paul A. Rabidoux 2001-08-21
6271555 Borderless wordline for DRAM cell Mark C. Hakey, Steven J. Holmes, Wendell P. Noble 2001-08-07
6261933 Process for building borderless bitline, wordline amd DRAM structure Mark C. Hakey, William H. Ma, Wendell P. Noble 2001-07-17
6258661 Formation of out-diffused bitline by laser anneal Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, Thomas S. Kanarsky 2001-07-10