Issued Patents All Time
Showing 176–200 of 234 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8932959 | Method and system for etching plural layers on a workpiece including a lower layer containing an advanced memory material | Mang-Mang Ling, Jeremiah T. Pender, Kartik Ramaswamy, Andrew Nguyen, Sergey G. Belostotskiy +1 more | 2015-01-13 |
| 8895449 | Delicate dry clean | Lina Zhu, Sean S. Kang, Chia-Ling Kao | 2014-11-25 |
| 8871650 | Post etch treatment (PET) of a low-K dielectric film | Nicolas Bright, Thorsten Lill, Yifeng Zhou, Jamie Saephan, Ellie Yieh | 2014-10-28 |
| 8802572 | Method of patterning a low-k dielectric film | Jeremiah T. Pender, Qingjun Zhou, Dmitry Lubomirsky, Sergey G. Belostotskiy | 2014-08-12 |
| 8748322 | Silicon oxide recess etch | Nancy Fung, David T. Or, Qingjun Zhou, Lina Zhu, Jeremiah T. Pender +3 more | 2014-06-10 |
| 8741775 | Method of patterning a low-K dielectric film | Yifeng Zhou, Dmitry Lubomirsky, Ellie Yieh | 2014-06-03 |
| 8647990 | Method of patterning a low-K dielectric film | Yifeng Zhou, Khoi Doan, Jeremiah T. Pender | 2014-02-11 |
| 8314033 | Method of patterning a low-k dielectric film | Yifeng Zhou, Khoi Doan, Jeremiah T. Pender | 2012-11-20 |
| 8242031 | High quality silicon oxide films by remote plasma CVD from disilane precursors | Abhijit Basu Mallick, Ellie Yieh | 2012-08-14 |
| 8232176 | Dielectric deposition and etch back processes for bottom up gapfill | Dmitry Lubomirsky, Ellie Yieh | 2012-07-31 |
| 8153348 | Process sequence for formation of patterned hard mask film (RFP) without need for photoresist or dry etch | Shankar Venkataraman, Ellie Yieh | 2012-04-10 |
| 7989366 | Dopant activation in doped semiconductor substrates | Jeffrey C. Munro, Young S. Lee, Marlon Edward Menezes, Christopher Dennis Bencher, Vijay Parihar | 2011-08-02 |
| 7943531 | Methods for forming a silicon oxide layer over a substrate | Abhijit Basu Mallick, Ellie Yieh | 2011-05-17 |
| 7902080 | Deposition-plasma cure cycle process to enhance film quality of silicon dioxide | Xiaolin Chen, Shankar Venkataraman | 2011-03-08 |
| 7867923 | High quality silicon oxide films by remote plasma CVD from disilane precursors | Abhijit Basu Mallick, Ellie Yieh | 2011-01-11 |
| 7825044 | Curing methods for silicon dioxide multi-layers | Abhijit Basu Mallick, Timothy Weidman | 2010-11-02 |
| 7790634 | Method for depositing and curing low-k films for gapfill and conformal film applications | Jeffrey C. Munro | 2010-09-07 |
| 7749563 | Two-layer film for next generation damascene barrier application with good oxidation resistance | Yi Zheng, Li-Qun Xia | 2010-07-06 |
| 7745351 | Post deposition plasma treatment to increase tensile stress of HDP-CVD SIO2 | Xiaolin Chen, Dongqing Li, Jeffrey C. Munro, Marlon Edward Menezes | 2010-06-29 |
| 7745352 | Curing methods for silicon dioxide thin films deposited from alkoxysilane precursor with harp II process | Abhijit Basu Mallick, Timothy Weidman | 2010-06-29 |
| 7541297 | Method and system for improving dielectric film quality for void free gap fill | Abhijit Basu Mallick, Jeffrey C. Munro, Linlin Wang, Yi Zheng, Zheng Yuan +2 more | 2009-06-02 |
| 7524750 | Integrated process modulation (IPM) a novel solution for gapfill with HDP-CVD | Young S. Lee, Ellie Yieh, Anchuan Wang, Jason Bloking, Lung-Tien Han | 2009-04-28 |
| 7498273 | Formation of high quality dielectric films of silicon dioxide for STI: usage of different siloxane-based precursors for harp II—remote plasma enhanced deposition processes | Abhijit Basu Mallick, Jeffrey C. Munro | 2009-03-03 |
| 7494628 | Apparatus for abatement of by-products generated from deposition processes and cleaning of deposition chambers | Himanshu Pokharna, Phong Le | 2009-02-24 |
| 7465680 | Post deposition plasma treatment to increase tensile stress of HDP-CVD SIO2 | Xiaolin Chen, Dongqing Li, Jeffrey C. Munro, Marlon Edward Menezes | 2008-12-16 |