JP

James S. Papanu

Applied Materials: 63 patents #111 of 7,310Top 2%
📍 San Rafael, CA: #7 of 869 inventorsTop 1%
🗺 California: #5,306 of 386,348 inventorsTop 2%
Overall (All Time): #35,636 of 4,157,543Top 1%
63
Patents All Time

Issued Patents All Time

Showing 51–63 of 63 patents

Patent #TitleCo-InventorsDate
7648916 Method and apparatus for performing hydrogen optical emission endpoint detection for photoresist strip and residue removal Elizabeth Pavel, Mark Kawaguchi 2010-01-19
7604708 Cleaning of native oxide with hydrogen-containing radicals Bingxi Wood, Mark Kawaguchi, Roderick C. Mosely, Chiukun Steven Lai, Chien-Teh Kao +2 more 2009-10-20
7432177 Post-ion implant cleaning for silicon on insulator substrate preparation Han-Wen Chen, Brian J. Brown, Steven Verhaverbeke 2008-10-07
7374696 Method and apparatus for removing a halogen-containing residue Mark Kawaguchi, Scott Williams, Matthew F. Davis 2008-05-20
6991739 Method of photoresist removal in the presence of a dielectric layer having a low k-value Mark Kawaguchi, Huong Nguyen, Nikolaos Bekiaris 2006-01-31
6692903 Substrate cleaning apparatus and method Haojiang Chen, Mark Kawaguchi, Harald Herchen, Jeng H. Hwang, Guangxiang Jin +1 more 2004-02-17
6120608 Workpiece support platen for semiconductor process chamber Norman Shendon, David Palagashvili 2000-09-19
5885358 Gas injection slit nozzle for a plasma process reactor Dan Maydan, Steve S. Y. Mak, Donald Olgado, Gerald Yin, Timothy D. Driscoll +1 more 1999-03-23
5817534 RF plasma reactor with cleaning electrode for cleaning during processing of semiconductor wafers Yan Ye, Hiroji Hanawa, Diana Xiaobing Ma, Gerald Yin, Peter Loewenhardt +2 more 1998-10-06
5756400 Method and apparatus for cleaning by-products from plasma chamber surfaces Yan Ye, Diana Xiaobing Ma, Gerald Yin, Keshav Prasad, Mark Siegel +3 more 1998-05-26
5746875 Gas injection slit nozzle for a plasma process reactor Dan Maydan, Steve S. Y. Mak, Donald Olgado, Gerald Yin, Timothy D. Driscoll +1 more 1998-05-05
5643394 Gas injection slit nozzle for a plasma process reactor Dan Maydan, Steve S. Y. Mak, Donald Olgado, Gerald Yin, Timothy D. Driscoll +1 more 1997-07-01
5545289 Passivating, stripping and corrosion inhibition of semiconductor substrates Jian-Sheng Chen, Steve S. Y. Mak, Carmel Ish-Shalom, Peter Hsieh, Wesley Lau +5 more 1996-08-13