Issued Patents All Time
Showing 51–75 of 85 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8260446 | Spectrographic monitoring of a substrate during processing using index values | Jeffrey Drue David, Dominic J. Benvegnu, Boguslaw A. Swedek, Lakshmanan Karuppiah | 2012-09-04 |
| 8202738 | Endpoint method using peak location of modified spectra | Jeffrey Drue David, Garrett H. Sin, Dominic J. Benvegnu | 2012-06-19 |
| 8190285 | Feedback for polishing rate correction in chemical mechanical polishing | Jun Qian, Charles C. Garretson, Sivakumar Dhandapani, Jeffrey Drue David | 2012-05-29 |
| 8079894 | Chemical mechanical polishing system having multiple polishing stations and providing relative linear polishing motion | Robert D. Tolles, Norman Shendon, Sasson Somekh, Ilya Perlov, Eugene Gantvarg | 2011-12-20 |
| 8039397 | Using optical metrology for within wafer feed forward process control | Jeffrey Drue David, Boguslaw A. Swedek, Dominic J. Benvegnu, Zhize Zhu, Wen-Chiang Tu | 2011-10-18 |
| 8014004 | Determining physical property of substrate | Abraham Ravid, Boguslaw A. Swedek, Jeffrey Drue David, Jun Qian, Ingemar Carlsson +2 more | 2011-09-06 |
| 7952708 | High throughput measurement system | Abraham Ravid, Boguslaw A. Swedek, Dominic J. Benvegnu, Jeffrey Drue David, Jun Qian +3 more | 2011-05-31 |
| 7840375 | Methods and apparatus for generating a library of spectra | Abraham Ravid, Boguslaw A. Swedek, Dominic J. Benvegnu, Jeffrey Drue David, Jun Qian +3 more | 2010-11-23 |
| 7774086 | Substrate thickness measuring during polishing | Jeffrey Drue David, Dominic J. Benvegnu, Boguslaw A. Swedek, Lakshmanan Karuppiah | 2010-08-10 |
| 7768659 | Determining copper concentration in spectra | Dominic J. Benvegnu, Jeffrey Drue David, Boguslaw A. Swedek, Jimin Zhang | 2010-08-03 |
| 7746485 | Determining physical property of substrate | Abraham Ravid, Boguslaw A. Swedek, Jeffrey Drue David, Jun Qian, Ingemar Carlsson +2 more | 2010-06-29 |
| 7614939 | Chemical mechanical polishing system having multiple polishing stations and providing relative linear polishing motion | Robert D. Tolles, Norman Shendon, Sasson Somekh, Ilya Perlov, Eugene Gantvarg | 2009-11-10 |
| 7444198 | Determining physical property of substrate | Abraham Ravid, Boguslaw A. Swedek, Jeffrey Drue David, Jun Qian, Ingemar Carlsson +2 more | 2008-10-28 |
| 7409260 | Substrate thickness measuring during polishing | Jeffrey Drue David, Dominic J. Benvegnu, Boguslaw A. Swedek, Lakshmanan Karuppiah | 2008-08-05 |
| 7255632 | Chemical mechanical polishing system having multiple polishing stations and providing relative linear polishing motion | Robert D. Tolles, Norm Shendon, Sasson Somekh, Ilya Perlov, Eugene Gantvarg | 2007-08-14 |
| 7238090 | Polishing apparatus having a trough | Robert D. Tolles, Norm Shendon, Sasson Somekh, Ilya Perlov, Eugene Gantvarg | 2007-07-03 |
| 7175505 | Method for adjusting substrate processing times in a substrate polishing system | Sen-Hou Ko, Wei-Yung Hsu | 2007-02-13 |
| 7101261 | Fluid-pressure regulated wafer polishing head | Norman Shendon, Michael Sherwood | 2006-09-05 |
| 7097544 | Chemical mechanical polishing system having multiple polishing stations and providing relative linear polishing motion | Robert D. Tolles, Norm Shendon, Sasson Somekh, Ilya Perlov, Eugene Gantvarg | 2006-08-29 |
| 6716094 | Chemical mechanical polishing retaining ring | Norman Shendon, Michael Sherwood | 2004-04-06 |
| 6652368 | Chemical mechanical polishing carrier head | Norman Shendon, Michael Sherwood | 2003-11-25 |
| 6443824 | Fluid-pressure regulated wafer polishing head | Norman Shendon, Michael Sherwood | 2002-09-03 |
| 6290577 | Fluid pressure regulated wafer polishing head | Norman Shendon, Michael Sherwood | 2001-09-18 |
| 6126517 | System for chemical mechanical polishing having multiple polishing stations | Robert D. Tolles, Norm Shendon, Sasson Somekh, Ilya Perlov, Eugene Gantvarg | 2000-10-03 |
| 6080046 | Underwater wafer storage and wafer picking for chemical mechanical polishing | Norm Shendon, Ilya Perlov, Eugene Gantvarg, Robert D. Tolles, Sasson Somekh | 2000-06-27 |