Issued Patents All Time
Showing 26–50 of 85 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9227293 | Multi-platen multi-head polishing architecture | Jeffrey Drue David, Boguslaw A. Swedek, Doyle E. Bennett, Thomas H. Osterheld, Benjamin Cherian +3 more | 2016-01-05 |
| 9168630 | User-input functions for data sequences in polishing endpoint detection | Jeffrey Drue David, Dominic J. Benvegnu, Boguslaw A. Swedek | 2015-10-27 |
| 9142466 | Using spectra to determine polishing endpoints | Boguslaw A. Swedek, Dominic J. Benvegnu, Jeffrey Drue David | 2015-09-22 |
| 8977379 | Endpoint method using peak location of spectra contour plots versus time | Jeffrey Drue David, Dominic J. Benvegnu, Boguslaw A. Swedek | 2015-03-10 |
| 8954186 | Selecting reference libraries for monitoring of multiple zones on a substrate | Jun Qian, Boguslaw A. Swedek, Jeffrey Drue David, Sivakumar Dhandapani, Thomas H. Osterheld | 2015-02-10 |
| 8930013 | Adaptively tracking spectrum features for endpoint detection | Jeffrey Drue David, Thian Choi Lim, Gary Lam | 2015-01-06 |
| 8874250 | Spectrographic monitoring of a substrate during processing using index values | Jeffrey Drue David, Dominic J. Benvegnu, Boguslaw A. Swedek, Lakshmanan Karuppiah | 2014-10-28 |
| 8860932 | Detection of layer clearing using spectral monitoring | Jimin Zhang, Zhihong Wang, Wen-Chiang Tu | 2014-10-14 |
| 8834229 | Dynamically tracking spectrum features for endpoint detection | Jeffrey Drue David | 2014-09-16 |
| 8814631 | Tracking spectrum features in two dimensions for endpoint detection | Jeffrey Drue David, Xiaoyuan Hu, Zhize Zhu | 2014-08-26 |
| 8755927 | Feedback for polishing rate correction in chemical mechanical polishing | Jun Qian, Charles C. Garretson, Sivakumar Dhandapani, Jeffrey Drue David | 2014-06-17 |
| 8755928 | Automatic selection of reference spectra library | Jimin Zhang, Zhihong Wang, Jeffrey Drue David, Boguslaw A. Swedek, Dominic J. Benvegnu | 2014-06-17 |
| 8751033 | Adaptive tracking spectrum features for endpoint detection | Jeffrey Drue David, Dominic J. Benvegnu, Boguslaw A. Swedek | 2014-06-10 |
| 8718810 | Semi-quantitative thickness determination | Dominic J. Benvegnu, Boguslaw A. Swedek, Jeffrey Drue David | 2014-05-06 |
| 8679979 | Using optical metrology for within wafer feed forward process control | Jeffrey Drue David, Boguslaw A. Swedek, Dominic J. Benvegnu, Zhize Zhu, Wen-Chiang Tu | 2014-03-25 |
| 8666665 | Automatic initiation of reference spectra library generation for optical monitoring | Jeffrey Drue David, Jun Qian, Jimin Zhang | 2014-03-04 |
| 8579675 | Methods of using optical metrology for feed back and feed forward process control | Jeffrey Drue David, Boguslaw A. Swedek, Dominic J. Benvegnu, Zhize Zhu, Wen-Chiang Tu | 2013-11-12 |
| 8569174 | Using spectra to determine polishing endpoints | Boguslaw A. Swedek, Dominic J. Benvegnu, Jeffrey Drue David | 2013-10-29 |
| 8554351 | Spectrographic monitoring of a substrate during processing using index values | Jeffrey Drue David, Dominic J. Benvegnu, Boguslaw A. Swedek, Lakshmanan Karuppiah | 2013-10-08 |
| RE44491 | Chemical mechanical polishing retaining ring | Norman Shendon, Michael Sherwood | 2013-09-10 |
| 8467896 | Feedback for polishing rate correction in chemical mechanical polishing | Jun Qian, Charles C. Garretson, Sivakumar Dhandapani, Jeffrey Drue David | 2013-06-18 |
| 8392012 | Multiple libraries for spectrographic monitoring of zones of a substrate during processing | Jeffrey Drue David, Boguslaw A. Swedek | 2013-03-05 |
| 8369978 | Adjusting polishing rates by using spectrographic monitoring of a substrate during processing | Jeffrey Drue David, Dominic J. Benvegnu, Boguslaw A. Swedek | 2013-02-05 |
| 8352061 | Semi-quantitative thickness determination | Dominic J. Benvegnu, Boguslaw A. Swedek, Jeffrey Drue David | 2013-01-08 |
| 8292693 | Using optical metrology for wafer to wafer feed back process control | Jeffrey Drue David, Boguslaw A. Swedek, Dominic J. Benvegnu, Zhize Zhu, Wen-Chiang Tu | 2012-10-23 |