Issued Patents All Time
Showing 51–75 of 88 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9054048 | NH3 containing plasma nitridation of a layer on a substrate | Wei Liu, Malcolm J. Bevan, Johanes S. Swenberg | 2015-06-09 |
| 9012336 | Method for conformal treatment of dielectric films using inductively coupled plasma | Heng Pan, Matthew S. Rogers, Johanes F. Swenberg, Wei Liu, David Chu +1 more | 2015-04-21 |
| 8993458 | Methods and apparatus for selective oxidation of a substrate | Agus Sofian Tjandra, Johanes F. Swenberg, Lara Hawrylchak | 2015-03-31 |
| 8916484 | Remote plasma radical treatment of silicon oxide | Yoshitaka Yokota | 2014-12-23 |
| 8871645 | Semiconductor devices suitable for narrow pitch applications and methods of fabrication thereof | Udayan Ganguly, Yoshita Yokota, Jing Tang, Sunderraj Thirupapuliyur, Shiyu Sun +6 more | 2014-10-28 |
| 8846509 | Remote radical hydride dopant incorporation for delta doping in silicon | Johanes S. Swenberg | 2014-09-30 |
| 8808564 | Method and apparatus for selective nitridation process | Matthew S. Rogers | 2014-08-19 |
| 8741785 | Remote plasma radical treatment of silicon oxide | Yoshitaka Yokota | 2014-06-03 |
| 8497193 | Method of thermally treating silicon with oxygen | Yoshitaka Yokota, Sundar Ramamurthy, Vedapuram S. Achutharaman, Cory Czarnik, Mehran Behdjat | 2013-07-30 |
| 8492292 | Methods of forming oxide layers on substrates | Yoshitaka Yokota, Agus Sofian Tjandra, Yonah Cho, Matthew S. Rogers | 2013-07-23 |
| 8435906 | Methods for forming conformal oxide layers on semiconductor devices | Agus Sofian Tjandra, Johanes F. Swenberg, Yoshitaka Yokota | 2013-05-07 |
| 8409353 | Water cooled gas injector | Yoshitaka Yokota, Sundar Ramamurthy, Vedapuram S. Achutharaman, Cory Czarnik, Mehran Behdjat | 2013-04-02 |
| 8338220 | Negatively charged passivation layer in a photovoltaic cell | Peter G. Borden | 2012-12-25 |
| 8323754 | Stabilization of high-k dielectric materials | Pravin K. Narwankar, Shreyas Kher, Randhir P. S. Thakur, Shankar Muthukrishnan, Philip Allan Kraus | 2012-12-04 |
| 8198671 | Modification of charge trap silicon nitride with oxygen plasma | Tze Wing Poon, Udayan Ganguly, Johanes S. Swenberg | 2012-06-12 |
| 8168462 | Passivation process for solar cell fabrication | Peter G. Borden, Michael P. Stewart, Li Xu, Hemant P. Mungekar | 2012-05-01 |
| 8163343 | Method of forming an aluminum oxide layer | Shreyas Kher, Lucien Date | 2012-04-24 |
| 8043981 | Dual frequency low temperature oxidation of a semiconductor device | Kai Ma, Yoshitaka Yokota | 2011-10-25 |
| 7972441 | Thermal oxidation of silicon using ozone | Yoshitaka Yokota, Sundar Ramamurthy, Vedapuram S. Achutharaman, Cory Czarnik, Mehran Behdjat | 2011-07-05 |
| 7972933 | Method of selective nitridation | Johanes S. Swenberg, Udayan Ganguly, Theresa Kramer Guarini, Yonah Cho | 2011-07-05 |
| 7910497 | Method of forming dielectric layers on a substrate and apparatus therefor | Tejal Goyani, Johanes F. Swenberg | 2011-03-22 |
| 7902018 | Fluorine plasma treatment of high-k gate stack for defect passivation | Philip Allan Kraus, Khaled Ahmed | 2011-03-08 |
| 7888217 | Method for fabricating a gate dielectric of a field effect transistor | Thai Cheng Chua, Cory Czarnik, Khaled Ahmed, Philip Allan Kraus | 2011-02-15 |
| 7863193 | Integrated circuit fabrication process using a compression cap layer in forming a silicide with minimal post-laser annealing dopant deactivation | Yi Ma, Philip Allan Kraus, Khaled Ahmed, Abhilash J. Mayur | 2011-01-04 |
| 7846793 | Plasma surface treatment for SI and metal nanocrystal nucleation | Sean M. Seutter, Ming Li, Phillip Kraus | 2010-12-07 |