Issued Patents All Time
Showing 51–75 of 85 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6176667 | Multideck wafer processing system | Kevin Fairbairn | 2001-01-23 |
| 6170428 | Symmetric tunable inductively coupled HDP-CVD reactor | Fred C. Redeker, Farhad Moghadam, Hiroji Hanawa, Tetsuya Ishikawa, Dan Maydan +5 more | 2001-01-09 |
| 6136163 | Apparatus for electro-chemical deposition with thermal anneal chamber | Robin Cheung, Avi Tepman, Dan Carl | 2000-10-24 |
| 6129044 | Apparatus for substrate processing with improved throughput and yield | Jun Zhao, Avi Tepman, Mei Chang, Lee Luo, Alex Schreiber +4 more | 2000-10-10 |
| 6123864 | Etch chamber | Simon W. Tam, Semyon Sherstinsky, Mei Chang, Alan F. Morrison | 2000-09-26 |
| 6109206 | Remote plasma source for chamber cleaning | Dan Maydan, Romuald Nowak | 2000-08-29 |
| 6103014 | Chemical vapor deposition chamber | Lawrence Chung-Lai Lei, Ilya Perlov, Karl A. Littau, Alan F. Morrison, Mei Chang | 2000-08-15 |
| 5964947 | Removable pumping channel liners within a chemical vapor deposition chamber | Jun Zhao, Avi Tepman, Mei Chang, Lee Luo, Alex Schreiber +4 more | 1999-10-12 |
| 5935338 | Chemical vapor deposition chamber | Lawrence Chung-Lai Lei, Ilya Perlov, Karl A. Littau, Alan F. Morrison, Mei Chang | 1999-08-10 |
| 5882419 | Chemical vapor deposition chamber | Mei Chang, Ilya Perlov, Karl A. Littau, Alan F. Morrison, Lawrence Chung-Lai Lei | 1999-03-16 |
| 5856240 | Chemical vapor deposition of a thin film onto a substrate | Mei Chang, Ilya Perlov, Karl A. Littau, Alan F. Morrison, Lawrence Chung-Lai Lei | 1999-01-05 |
| 5855681 | Ultra high throughput wafer vacuum processing system | Dan Maydan, Sasson Somekh, Kevin Fairbairn, Christopher T. Lane, Kelly Colborne +2 more | 1999-01-05 |
| 5846332 | Thermally floating pedestal collar in a chemical vapor deposition chamber | Jun Zhao, Avi Tepman, Mei Chang, Lee Luo, Alex Schreiber +4 more | 1998-12-08 |
| 5695568 | Chemical vapor deposition chamber | Mei Chang, Ilya Perlov, Karl A. Littau, Alan F. Morrison, Lawrence Chung-Lai Lei | 1997-12-09 |
| 5516367 | Chemical vapor deposition chamber with a purge guide | Lawrence Chung-Lai Lei, Ilya Perlov, Karl A. Littau, Alan F. Morrison, Mei Chang | 1996-05-14 |
| 5476548 | Reducing backside deposition in a substrate processing apparatus through the use of a shadow ring | Lawrence Chung-Lai Lei, Cissy Leung, Eric A. Englhardt | 1995-12-19 |
| 5421401 | Compound clamp ring for semiconductor wafers | Semyon Sherstinsky, Mei Chang, Charles C. Harris, Alan F. Morrison, Virendra V. Rana +2 more | 1995-06-06 |
| 5384008 | Process and apparatus for full wafer deposition | Sasson Somekh | 1995-01-24 |
| 5356659 | Metallization for semiconductor devices | Desu Seshubabu, Hans P. W. Hey | 1994-10-18 |
| 5292554 | Deposition apparatus using a perforated pumping plate | Steve Ghanayem, Virendra V. Rana | 1994-03-08 |
| 5201990 | Process for treating aluminum surfaces in a vacuum apparatus | Mei Chang, Turgut Sahin, Alfred Mak, Cissy Leung | 1993-04-13 |
| 4985373 | Multiple insulating layer for two-level interconnected metallization in semiconductor integrated circuit structures | Hyman J. Levinstein, William D. Powell, Jr. | 1991-01-15 |
| 4953399 | Method and apparatus for determining characteristics of clay-bearing formations | Walter H. Fertl | 1990-09-04 |
| 4851370 | Fabricating a semiconductor device with low defect density oxide | Raymond H. Doklan, Edward P. Martin, Jr., Pradip K. Roy, Scott F. Shive | 1989-07-25 |
| 4756189 | Method and apparatus for determining characteristics of clay-bearing formations | Walter H. Fertl | 1988-07-12 |