Issued Patents All Time
Showing 25 most recent of 57 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8643083 | Electronic devices with ultraviolet blocking layers | Bryon K. Hance, Brian D. White, Joseph William Wiseman, Allen L. Evans | 2014-02-04 |
| 8202810 | Low-H plasma treatment with N2 anneal for electronic memory devices | Alexander H. Nickel, Allen L. Evans, Minh Quoc Tran, Lu You, Minh Van Ngo +4 more | 2012-06-19 |
| 8171627 | Method of forming an electronic device | Bryon K. Hance, Brian D. White, Joseph William Wiseman, Allen L. Evans | 2012-05-08 |
| 6955928 | Closed loop residual gas analyzer process control technique | — | 2005-10-18 |
| 6809032 | Method and apparatus for detecting the endpoint of a chemical-mechanical polishing operation using optical techniques | Frank Mauersberger, Peter J. Beckage, Paul R. Besser, Frederick N. Hause, Errol Todd Ryan +1 more | 2004-10-26 |
| 6800494 | Method and apparatus for controlling copper barrier/seed deposition processes | Howard E. Castle | 2004-10-05 |
| 6614064 | Transistor having a gate stick comprised of a metal, and a method of making same | Paul R. Besser | 2003-09-02 |
| 6555479 | Method for forming openings for conductive interconnects | Frederick N. Hause, Paul R. Besser, Frank Mauersberger, Errol Todd Ryan, John A. Iacoponi +1 more | 2003-04-29 |
| 6514858 | Test structure for providing depth of polish feedback | Frederick N. Hause, Paul R. Besser, Frank Mauersberger, Errol Todd Ryan, John A. Iacoponi +1 more | 2003-02-04 |
| 6489240 | Method for forming copper interconnects | John A. Iacoponi, Paul R. Besser, Frederick N. Hause, Frank Mauersberger, Errol Todd Ryan +1 more | 2002-12-03 |
| 6413846 | Contact each methodology and integration scheme | Paul R. Besser, Errol Todd Ryan, Frederick N. Hause, Frank Mauersberger, John A. Iacoponi +1 more | 2002-07-02 |
| 6395100 | Method of improving vacuum quality in semiconductor processing chambers | Willie Rivera | 2002-05-28 |
| 6376330 | Dielectric having an air gap formed between closely spaced interconnect lines | H. Jim Fulford, Robert Dawson, Fred N. Hause, Basab Bandyopadhyay, Mark W. Michael | 2002-04-23 |
| 6353253 | Semiconductor isolation region bounded by a trench and covered with an oxide to improve planarization | Fred N. Hause, Basab Bandyopadhyay, H. Jim Fulford, Robert Dawson, Mark W. Michael | 2002-03-05 |
| 6326298 | Substantially planar semiconductor topography using dielectrics and chemical mechanical polish | Robert Dawson, Mark W. Michael, Basab Bandyopadhyay, H. Jim Fulford, Fred N. Hause | 2001-12-04 |
| 6255215 | Semiconductor device having silicide layers formed using a collimated metal layer | Fred N. Hause, Charles E. May | 2001-07-03 |
| 6211072 | CVD Tin Barrier process with improved contact resistance | — | 2001-04-03 |
| 6208015 | Interlevel dielectric with air gaps to lessen capacitive coupling | Basab Bandyopadhyay, H. Jim Fulford, Robert Dawson, Fred N. Hause, Mark W. Michael | 2001-03-27 |
| 6191032 | Thin titanium film as self-regulating filter for silicon migration into aluminum metal lines | Don A. Tiffin, David Soza, Patrick L. Smith, Allen W. White, Tim Z. Hossain | 2001-02-20 |
| 6156650 | Method of releasing gas trapped during deposition | Tim Z. Hossain, Berta Valdez, Renee S. Prusik, Amiya R. Ghatak-Roy | 2000-12-05 |
| 6153833 | Integrated circuit having interconnect lines separated by a dielectric having a capping layer | Robert Dawson, Mark W. Michael, Basab Bandyopadhyay, H. Jim Fulford, Fred N. Hause | 2000-11-28 |
| 6150721 | Integrated circuit which uses a damascene process for producing staggered interconnect lines | Basab Bandyopadhyay, H. Jim Fulford, Robert Dawson, Fred N. Hause, Mark W. Michael | 2000-11-21 |
| 6127264 | Integrated circuit having conductors of enhanced cross-sectional area | Basab Bandyopadhyay, H. Jim Fulford, Robert Dawson, Fred N. Hause, Mark W. Michael | 2000-10-03 |
| 6127719 | Subfield conductive layer and method of manufacture | H. Jim Fulford, Robert Dawson, Fred N. Hause, Basab Bandyopadhyay, Mark W. Michael | 2000-10-03 |
| 6091149 | Dissolvable dielectric method and structure | Fred N. Hause, Basab Bandyopadhyay, Robert Dawson, H. Jim Fulford, Mark W. Michael | 2000-07-18 |