Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Closed loop residual gas analyzer process control technique

Closed loop residual gas analyzer process control technique

US Patent 6955928 · Granted Oct 18, 2005

Estimated economic value: $5,936,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Electronic devices with ultraviolet blocking layers2014
Low-H plasma treatment with N2 anneal for electronic memory devices2012
Method of forming an electronic device2012
Method and apparatus for detecting the endpoint of a chemical-mechanical polishi2004
Method and apparatus for controlling copper barrier/seed deposition processes2004
Transistor having a gate stick comprised of a metal, and a method of making same2003
Method for forming openings for conductive interconnects2003
Test structure for providing depth of polish feedback2003
Method for forming copper interconnects2002
Contact each methodology and integration scheme2002
Method of improving vacuum quality in semiconductor processing chambers2002
Dielectric having an air gap formed between closely spaced interconnect lines2002