NT

Nicholas H. Tripsas

AM AMD: 45 patents #170 of 9,279Top 2%
SL Spansion Llc.: 16 patents #40 of 769Top 6%
📍 San Jose, CA: #759 of 32,062 inventorsTop 3%
🗺 California: #6,332 of 386,348 inventorsTop 2%
Overall (All Time): #43,390 of 4,157,543Top 2%
57
Patents All Time

Issued Patents All Time

Showing 26–50 of 57 patents

Patent #TitleCo-InventorsDate
6852586 Self assembly of conducting polymer for formation of polymer memory cell Matthew S. Buynoski, Suzette K. Pangrle, Uzodinma Okoroanyanwu 2005-02-08
6803272 Use of high-K dielectric material in modified ONO structure for semiconductor devices Arvind Halliyal, Mark T. Ramsbey, Kuo-Tung Chang, Robert B. Ogle 2004-10-12
6787458 Polymer memory device formed in via opening Matthew S. Buynoski, Suzette K. Pangrle, Uzodinma Okoroanyanwu, Angela T. Hui, Christopher F. Lyons +7 more 2004-09-07
6783591 Laser thermal annealing method for high dielectric constant gate oxide films Arvind Halliyal, Mark T. Ramsbey 2004-08-31
6753247 Method(s) facilitating formation of memory cell(s) and patterned conductive Uzodinma Okoroanyanwu, Suzette K. Pangrle, Matthew S. Buynoski, Mark S. Chang, Ramkumar Subramanian +1 more 2004-06-22
6753570 Memory device and method of making Kuo-Tung Chang, Mark T. Ramsbey 2004-06-22
6746971 Method of forming copper sulfide for memory cell Minh Van Ngo, Sergey Lopatin, Suzette K. Pangrle, Hieu Pham 2004-06-08
6735123 High density dual bit flash memory cell with non planar structure Mark T. Ramsbey, Wei Zheng, Effiong Ibok, Fred Cheung 2004-05-11
6674138 Use of high-k dielectric materials in modified ONO structure for semiconductor devices Arvind Halliyal, Mark T. Ramsbey, Kuo-Tung Chang, Robert B. Ogle 2004-01-06
6667243 Etch damage repair with thermal annealing Mark T. Ramsbey, Arvind Halliyal, Jeffrey A. Shields, Yider Wu 2003-12-23
6639271 Fully isolated dielectric memory cell structure for a dual bit nitride storage device and process for making same Wei Zheng, Mark Randolph, Zoran Krivokapic, Jack F. Thomas, Mark T. Ramsbey 2003-10-28
6630383 Bi-layer floating gate for improved work function between floating gate and a high-K dielectric layer Effiong Ibok, Wei Zheng, Mark T. Ramsbey, Fred Cheung 2003-10-07
6627945 Memory device and method of making Mark T. Ramsbey 2003-09-30
6579778 Source bus formation for a flash memory using silicide Mark T. Ramsbey 2003-06-17
6548855 Non-volatile memory dielectric as charge pump dielectric Mark T. Ramsbey, Arvind Halliyal, Kuo-Tung Chang, Wei Zheng, Unsoon Kim 2003-04-15
6500713 Method for repairing damage to charge trapping dielectric layer from bit line implantation Mark T. Ramsbey, Arvind Halliyal 2002-12-31
6455888 Memory cell structure for elimination of oxynitride (ONO) etch residue and polysilicon stringers Kathleen R. Early, Michael K. Templeton, Maria C. Chan 2002-09-24
6420702 Non-charging critical dimension SEM metrology standard Bhanwar Singh, Michael K. Templeton 2002-07-16
6410956 Method and system for using a spacer to offset implant damage and reduce lateral diffusion in flash memory devices Vei-Han Chan, Scott Luning, Mark Randolph, Daniel Sobek, Janet Wang +2 more 2002-06-25
6355933 Ion source and method for using same Robert B. Ogle 2002-03-12
6211020 Process for fabricating a common source region in memory devices Mark T. Ramsbey 2001-04-03
6153487 Approach for the formation of semiconductor devices which reduces band-to-band tunneling current and short-channel effects Scott Luning, Timothy Thurgate, Daniel Sobek 2000-11-28
6110833 Elimination of oxynitride (ONO) etch residue and polysilicon stringers through isolation of floating gates on adjacent bitlines by polysilicon oxidation Kathleen R. Early, Michael K. Templeton, Maria C. Chan 2000-08-29
6063665 Method for silicon surface control for shallow junction formation David K. Foote 2000-05-16
6043120 Elimination of oxynitride (ONO) etch residue and polysilicon stringers through isolation of floating gates on adjacent bitlines by polysilicon oxidation Kathleen R. Early, Michael K. Templeton, Maria C. Chan 2000-03-28