Issued Patents 2016
Showing 25 most recent of 31 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9520303 | Aluminum selective etch | Xikun Wang, Nitin K. Ingle | 2016-12-13 |
| 9502258 | Anisotropic gap etch | Jun Xue, Ching-Mei Hsu, Zihui Li, Ludovic Godet, Nitin K. Ingle | 2016-11-22 |
| 9478434 | Chlorine-based hardmask removal | Xikun Wang, Mandar B. Pandit, Zhenjiang Cui, Mikhail Korolik, Nitin K. Ingle +1 more | 2016-10-25 |
| 9478432 | Silicon oxide selective removal | Zhijun Chen, Nitin K. Ingle | 2016-10-25 |
| 9449846 | Vertical gate separation | Jie Liu, Vinod R. Purayath, Xikun Wang, Nitin K. Ingle | 2016-09-20 |
| 9449850 | Processing systems and methods for halide scavenging | Xinglong Chen, Zihui Li, Hiroshi Hamana, Zhijun Chen, Ching-Mei Hsu +5 more | 2016-09-20 |
| 9449845 | Selective titanium nitride etching | Jie Liu, Jingchun Zhang, Nitin K. Ingle, Seung Ho Park, Zhijun Chen +1 more | 2016-09-20 |
| 9437451 | Radical-component oxide etch | Zhijun Chen, Jingchun Zhang, Ching-Mei Hsu, Seung Ho Park, Nitin K. Ingle | 2016-09-06 |
| 9418858 | Selective etch of silicon by way of metastable hydrogen termination | Jingchun Zhang, Nitin K. Ingle, Young S. Lee | 2016-08-16 |
| 9412608 | Dry-etch for selective tungsten removal | Xikun Wang, Ching-Mei Hsu, Nitin K. Ingle, Zihui Li | 2016-08-09 |
| 9406523 | Highly selective doped oxide removal method | Zhijun Chen, Zihui Li, Nitin K. Ingle, Shankar Venkataraman | 2016-08-02 |
| 9390937 | Silicon-carbon-nitride selective etch | Zhijun Chen, Jingchun Zhang, Nitin K. Ingle | 2016-07-12 |
| 9384997 | Dry-etch selectivity | He Ren, Jang-Gyoo Yang, Jonghoon Baek, Soonam Park, Saurabh Garg +2 more | 2016-07-05 |
| 9378969 | Low temperature gas-phase carbon removal | Ching-Mei Hsu, Nitin K. Ingle, Hiroshi Hamana | 2016-06-28 |
| 9373522 | Titanium nitride removal | Xikun Wang, Mandar B. Pandit, Nitin K. Ingle | 2016-06-21 |
| 9368364 | Silicon etch process with tunable selectivity to SiO2 and other materials | Seung Ho Park | 2016-06-14 |
| 9355863 | Non-local plasma oxide etch | Zhijun Chen, Seung Ho Park, Mikhail Korolik, Nitin K. Ingle | 2016-05-31 |
| 9355862 | Fluorine-based hardmask removal | Mandar B. Pandit, Xikun Wang, Zhenjiang Cui, Mikhail Korolik, Nitin K. Ingle | 2016-05-31 |
| 9355856 | V trench dry etch | Xikun Wang, Nitin K. Ingle | 2016-05-31 |
| 9349605 | Oxide etch selectivity systems and methods | Lin Xu, Zhijun Chen, Son T. Nguyen | 2016-05-24 |
| 9343272 | Self-aligned process | Mandar B. Pandit, Nitin K. Ingle | 2016-05-17 |
| 9343327 | Methods for etch of sin films | Jingchun Zhang, Nitin K. Ingle | 2016-05-17 |
| 9324576 | Selective etch for silicon films | Jingchun Zhang, Nitin K. Ingle | 2016-04-26 |
| 9309598 | Oxide and metal removal | Xikun Wang, Jie Liu, Nitin K. Ingle, Jeffrey W. Anthis, Benjamin Schmiege | 2016-04-12 |
| 9299575 | Gas-phase tungsten etch | Seung Ho Park, Xikun Wang, Jie Liu, Sang Jin Kim | 2016-03-29 |