| 9472417 |
Plasma-free metal etch |
Nitin K. Ingle, Jessica S. Kachian, Lin Xu, Xikun Wang, Jeffrey W. Anthis |
2016-10-18 |
| 9460898 |
Plasma generation chamber with smooth plasma resistant coating |
Sung Je Kim, Dmitry Lubomirsky |
2016-10-04 |
| 9384997 |
Dry-etch selectivity |
He Ren, Jang-Gyoo Yang, Jonghoon Baek, Anchuan Wang, Saurabh Garg +2 more |
2016-07-05 |
| 9373517 |
Semiconductor processing with DC assisted RF power for improved control |
Jang-Gyoo Yang, Xinglong Chen, Jonghoon Baek, Saurabh Garg, Shankar Venkataraman |
2016-06-21 |
| 9355922 |
Systems and methods for internal surface conditioning in plasma processing equipment |
Yufei Zhu, Edwin C. Suarez, Nitin K. Ingle, Dmitry Lubomirsky, Jiayin Huang |
2016-05-31 |
| 9299537 |
Radial waveguide systems and methods for post-match control of microwaves |
Satoru Kobayashi, Dmitry Lubomirsky, Hideo Sugai |
2016-03-29 |
| 9299582 |
Selective etch for metal-containing materials |
Nitin K. Ingle, Jessica S. Kachian, Lin Xu, Xikun Wang, Jeffrey W. Anthis |
2016-03-29 |
| 9299538 |
Radial waveguide systems and methods for post-match control of microwaves |
Satoru Kobayashi, Dmitry Lubomirsky |
2016-03-29 |
