| 9520303 |
Aluminum selective etch |
Anchuan Wang, Nitin K. Ingle |
2016-12-13 |
| 9478434 |
Chlorine-based hardmask removal |
Mandar B. Pandit, Zhenjiang Cui, Mikhail Korolik, Anchuan Wang, Nitin K. Ingle +1 more |
2016-10-25 |
| 9472417 |
Plasma-free metal etch |
Nitin K. Ingle, Jessica S. Kachian, Lin Xu, Soonam Park, Jeffrey W. Anthis |
2016-10-18 |
| 9449846 |
Vertical gate separation |
Jie Liu, Vinod R. Purayath, Anchuan Wang, Nitin K. Ingle |
2016-09-20 |
| 9412608 |
Dry-etch for selective tungsten removal |
Ching-Mei Hsu, Nitin K. Ingle, Zihui Li, Anchuan Wang |
2016-08-09 |
| 9373522 |
Titanium nitride removal |
Mandar B. Pandit, Anchuan Wang, Nitin K. Ingle |
2016-06-21 |
| 9355862 |
Fluorine-based hardmask removal |
Mandar B. Pandit, Zhenjiang Cui, Mikhail Korolik, Anchuan Wang, Nitin K. Ingle |
2016-05-31 |
| 9355856 |
V trench dry etch |
Anchuan Wang, Nitin K. Ingle |
2016-05-31 |
| 9309598 |
Oxide and metal removal |
Jie Liu, Anchuan Wang, Nitin K. Ingle, Jeffrey W. Anthis, Benjamin Schmiege |
2016-04-12 |
| 9299583 |
Aluminum oxide selective etch |
Anchuan Wang, Nitin K. Ingle |
2016-03-29 |
| 9299582 |
Selective etch for metal-containing materials |
Nitin K. Ingle, Jessica S. Kachian, Lin Xu, Soonam Park, Jeffrey W. Anthis |
2016-03-29 |
| 9299575 |
Gas-phase tungsten etch |
Seung Ho Park, Jie Liu, Anchuan Wang, Sang Jin Kim |
2016-03-29 |
| 9287134 |
Titanium oxide etch |
Lin Xu, Anchuan Wang, Nitin K. Ingle |
2016-03-15 |
